Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing

The experimental data on Raman scattering (RS) and optical absorption in
 structures with thin silicon layers on various substrates, as well as in multilayer
 quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is
 shown that laser annealing on...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2014
Автор: Okhrimenko, O.B.
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/118373
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Variation of optical parameters of multilayer structures
 with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Okhrimenko, O.B.
author_facet Okhrimenko, O.B.
citation_txt Variation of optical parameters of multilayer structures
 with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The experimental data on Raman scattering (RS) and optical absorption in
 structures with thin silicon layers on various substrates, as well as in multilayer
 quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is
 shown that laser annealing on the above structures leads to changes in spectra of RS and
 optical transmission that can be explained within the critical action model. The value of
 critical action of laser radiation is determined for the structures studied.
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-24T02:23:01Z
publishDate 2014
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Okhrimenko, O.B.
2017-05-30T06:05:25Z
2017-05-30T06:05:25Z
2014
Variation of optical parameters of multilayer structures
 with thin silicon layers at laser annealing / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 200-204. — Бібліогр.: 13 назв. — англ.
1560-8034
PACS 71.20.Nr, 78.40.Fy
https://nasplib.isofts.kiev.ua/handle/123456789/118373
The experimental data on Raman scattering (RS) and optical absorption in
 structures with thin silicon layers on various substrates, as well as in multilayer
 quartz/Si/SiO₂, SiC/Si/SiO₂ and glass/Si₃N₄/Si/SiO₂ structures, are summarized. It is
 shown that laser annealing on the above structures leads to changes in spectra of RS and
 optical transmission that can be explained within the critical action model. The value of
 critical action of laser radiation is determined for the structures studied.
The author is indebted to Dr. Sci. Prof. V.P. Kladko and
 Dr. Sci. V.V. Strelchuk for their interest in this work and
 valuable discussions.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
Article
published earlier
spellingShingle Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
Okhrimenko, O.B.
title Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_fullStr Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_full_unstemmed Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_short Variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
title_sort variation of optical parameters of multilayer structures with thin silicon layers at laser annealing
url https://nasplib.isofts.kiev.ua/handle/123456789/118373
work_keys_str_mv AT okhrimenkoob variationofopticalparametersofmultilayerstructureswiththinsiliconlayersatlaserannealing