Modification of optical properties and structure of thin films for enhancing absorption

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2014
• Main Author: Lysiuk, V.O.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/118375
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Modification of optical properties and structure of thin films
 for enhancing absorption / V.O. Lysiuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 209-212. — Бібліогр.: 14 назв. — англ.

The most used methods such as ion implantation, laser irradiation and
 nanosphere lithography for modification and creation of special microrelief of thin
 absorbing films on photosensitive substrates have been described. Controlled
 modification of surface structure of the samples for improving their optical properties,
 especially for enhancing absorption, has many applications in optical devices. The basic
 things were analyzed from selection of film materials and ways for their further
 processing to shapes and dimensions of the obtained surface structures. Theoretical
 modeling methods based on the Mie theory and statistical temporal mode-coupled theory
 have been used to explain the influence of surface microrelief on optical properties of the
 samples. Advantages and perspectives for application of the methods have been
 described and analyzed.