Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method

In this paper, we have considered the four-contact method for measurements
 of the specific contact resistivity of the ohmic contacts (ρc). The presented method for
 measuring ρc has been compared with several other methods. Limits of applying this
 method have been shown.

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2014
1. Verfasser: Sheremet, V.N.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118426
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Zitieren:Metrological aspects of researching the specific contact resistivity
 of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Sheremet, V.N.
author_facet Sheremet, V.N.
citation_txt Metrological aspects of researching the specific contact resistivity
 of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description In this paper, we have considered the four-contact method for measurements
 of the specific contact resistivity of the ohmic contacts (ρc). The presented method for
 measuring ρc has been compared with several other methods. Limits of applying this
 method have been shown.
first_indexed 2025-12-07T17:20:46Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-118426
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T17:20:46Z
publishDate 2014
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Sheremet, V.N.
2017-05-30T10:32:07Z
2017-05-30T10:32:07Z
2014
Metrological aspects of researching the specific contact resistivity
 of ohmic contacts by using the four-contact method / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 4. — С. 394-397. — Бібліогр.: 8 назв. — англ.
1560-8034
PACS 73.40.Ns, 73.40.Cg, 85.40.-e
https://nasplib.isofts.kiev.ua/handle/123456789/118426
In this paper, we have considered the four-contact method for measurements
 of the specific contact resistivity of the ohmic contacts (ρc). The presented method for
 measuring ρc has been compared with several other methods. Limits of applying this
 method have been shown.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
Article
published earlier
spellingShingle Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
Sheremet, V.N.
title Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_full Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_fullStr Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_full_unstemmed Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_short Metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
title_sort metrological aspects of researching the specific contact resistivity of ohmic contacts by using the four-contact method
url https://nasplib.isofts.kiev.ua/handle/123456789/118426
work_keys_str_mv AT sheremetvn metrologicalaspectsofresearchingthespecificcontactresistivityofohmiccontactsbyusingthefourcontactmethod