Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties

The technique of thermal vacuum deposition of Ge onto GaAs substrates has been used for obtaining nanocrystalline Ge films. Nanocrystalline character of the films is confirmed by atomic force microscopy of their surface and by the data of Raman light scattering. The most probable size of the nano...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2014
Hauptverfasser: Borblik, V.L., Korchevoi, A.A., Nikolenko, A.S., Strelchuk, V.V., Fonkich, A.M., Shwarts, Yu.M., Shwarts, M.M.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118485
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties / V.L. Borblik, A.A. Korchevoi, A.S. Nikolenko, V.V. Strelchuk, A.M. Fonkich, Yu.M. Shwarts, M.M. Shwarts // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 3. — С. 237-242. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118485
record_format dspace
spelling Borblik, V.L.
Korchevoi, A.A.
Nikolenko, A.S.
Strelchuk, V.V.
Fonkich, A.M.
Shwarts, Yu.M.
Shwarts, M.M.
2017-05-30T14:06:14Z
2017-05-30T14:06:14Z
2014
Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties / V.L. Borblik, A.A. Korchevoi, A.S. Nikolenko, V.V. Strelchuk, A.M. Fonkich, Yu.M. Shwarts, M.M. Shwarts // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 3. — С. 237-242. — Бібліогр.: 10 назв. — англ.
1560-8034
PACS 73.63.-b, 81.07.-b
https://nasplib.isofts.kiev.ua/handle/123456789/118485
The technique of thermal vacuum deposition of Ge onto GaAs substrates has been used for obtaining nanocrystalline Ge films. Nanocrystalline character of the films is confirmed by atomic force microscopy of their surface and by the data of Raman light scattering. The most probable size of the nanocrystallites forming the films decreases monotonically with decreasing their thickness. Electro conductivity of such the films proves to be high enough (1-10 Ohm·cm at room temperature) and has a character of variable range hopping conduction of Mott’s type. The hops, presumably, take place through the localized states connected with the grain boundaries.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
spellingShingle Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
Borblik, V.L.
Korchevoi, A.A.
Nikolenko, A.S.
Strelchuk, V.V.
Fonkich, A.M.
Shwarts, Yu.M.
Shwarts, M.M.
title_short Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
title_full Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
title_fullStr Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
title_full_unstemmed Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties
title_sort nanocrystalline ge films created by thermal vacuum deposition on gaas substrates: structural and electric properties
author Borblik, V.L.
Korchevoi, A.A.
Nikolenko, A.S.
Strelchuk, V.V.
Fonkich, A.M.
Shwarts, Yu.M.
Shwarts, M.M.
author_facet Borblik, V.L.
Korchevoi, A.A.
Nikolenko, A.S.
Strelchuk, V.V.
Fonkich, A.M.
Shwarts, Yu.M.
Shwarts, M.M.
publishDate 2014
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The technique of thermal vacuum deposition of Ge onto GaAs substrates has been used for obtaining nanocrystalline Ge films. Nanocrystalline character of the films is confirmed by atomic force microscopy of their surface and by the data of Raman light scattering. The most probable size of the nanocrystallites forming the films decreases monotonically with decreasing their thickness. Electro conductivity of such the films proves to be high enough (1-10 Ohm·cm at room temperature) and has a character of variable range hopping conduction of Mott’s type. The hops, presumably, take place through the localized states connected with the grain boundaries.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118485
citation_txt Nanocrystalline Ge films created by thermal vacuum deposition on GaAs substrates: structural and electric properties / V.L. Borblik, A.A. Korchevoi, A.S. Nikolenko, V.V. Strelchuk, A.M. Fonkich, Yu.M. Shwarts, M.M. Shwarts // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 3. — С. 237-242. — Бібліогр.: 10 назв. — англ.
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AT strelchukvv nanocrystallinegefilmscreatedbythermalvacuumdepositionongaassubstratesstructuralandelectricproperties
AT fonkicham nanocrystallinegefilmscreatedbythermalvacuumdepositionongaassubstratesstructuralandelectricproperties
AT shwartsyum nanocrystallinegefilmscreatedbythermalvacuumdepositionongaassubstratesstructuralandelectricproperties
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first_indexed 2025-12-02T09:05:49Z
last_indexed 2025-12-02T09:05:49Z
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