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Zinc oxide for electronic, photovoltaic and optoelectronic applications

We demonstrate that the atomic layer deposition (ALD) technique has large potential to be widely used in a production of ZnO films for applications in electronic, photovoltaic (PV) and optoelectronic devices. Low growth temperature makes the ALD-grown ZnO films suitable for construction of various s...

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Published in:Физика низких температур
Date:2011
Main Authors: Godlewski, M., Guziewicz, E., Kopalko, K., Łuka, G., Łukasiewicz, M.I., Krajewski, T., Witkowski, B.S., Gierałtowska, S.
Format: Article
Language:English
Published: Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України 2011
Subjects:
XVIII Уральская международная зимняя школа по физике полупроводников
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118518
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Zinc oxide for electronic, photovoltaic and optoelectronic applications / M. Godlewski, E. Guziewicz, K. Kopalko, G. Łuka, M.I. Łukasiewicz, T. Krajewski, B.S. Witkowski, S. Gierałtowska // Физика низких температур. — 2011. — Т. 37, № 3. — С. 301–307. — Бібліогр.: 44 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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