Using ellipsometry methods for depth analyzing the optical disc data layer relief structures

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2008
• Main Authors: Kravets, V.G., Gorbov, I.V.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2008
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/118596
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Using ellipsometry methods for depth analyzing the optical disc data layer relief structures / V.G. Kravets, I.V. Gorbov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 11-15. — Бібліогр.: 8 назв. — англ.

We studied the relief depth of the data layer formed in a glass disk by ion beam
 etching process with using classical ellipsometry at the constant wavelength 632.8 nm for
 different angles of incidence. It was found that for 0° and 90° azimuth angles, a pair of
 ellipsometric parameters Ψ and ∆ is sufficient to characterize the changes in light
 reflection for various structure depths. The depth of optical disc data layer relief
 structures was estimated via experimental dependences of ellipsometric parameters. The
 estimated data layer depths were found to be in good agreement with independent
 tunnelling electron microscopy measurements.