Using ellipsometry methods for depth analyzing the optical disc data layer relief structures

We studied the relief depth of the data layer formed in a glass disk by ion beam etching process with using classical ellipsometry at the constant wavelength 632.8 nm for different angles of incidence. It was found that for 0° and 90° azimuth angles, a pair of ellipsometric parameters Ψ and ∆ is...

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Datum:2008
Hauptverfasser: Kravets, V.G., Gorbov, I.V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2008
Schriftenreihe:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118596
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Using ellipsometry methods for depth analyzing the optical disc data layer relief structures / V.G. Kravets, I.V. Gorbov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 11-15. — Бібліогр.: 8 назв. — англ.

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