Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions

In this paper, we explore the electrophysical and electroluminescence (EL)
 properties of thermally grown 350 nm thick SiO₂ layers co-implanted with Si⁺
 and C⁺
 ions. The implanting fluencies were chosen in such a way that the peak concentration of
 excess Si and C...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2009
Main Authors: Nazarov, A.N., Osiyuk, I.N., Tiagulskyi, S.I., Lysenko, V.S., Tyagulskyy, I.P., Torbin, V.N., Omelchuk, V.V., Nazarova, T.M., Rebohle, L., Skorupa, W.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118612
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Cite this:Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions / A.N. Nazarov, I.N. Osiyuk, S.I. Tiagulskyi, V.S. Lysenko, I.P. Tyagulskyy, V.N. Torbin, V.V. Omelchuk, T.M. Nazarova, L. Rebohle, W. Skorupa // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 1. — С. 98-104 — Бібліогр.: 26 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Nazarov, A.N.
Osiyuk, I.N.
Tiagulskyi, S.I.
Lysenko, V.S.
Tyagulskyy, I.P.
Torbin, V.N.
Omelchuk, V.V.
Nazarova, T.M.
Rebohle, L.
Skorupa, W.
author_facet Nazarov, A.N.
Osiyuk, I.N.
Tiagulskyi, S.I.
Lysenko, V.S.
Tyagulskyy, I.P.
Torbin, V.N.
Omelchuk, V.V.
Nazarova, T.M.
Rebohle, L.
Skorupa, W.
citation_txt Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions / A.N. Nazarov, I.N. Osiyuk, S.I. Tiagulskyi, V.S. Lysenko, I.P. Tyagulskyy, V.N. Torbin, V.V. Omelchuk, T.M. Nazarova, L. Rebohle, W. Skorupa // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 1. — С. 98-104 — Бібліогр.: 26 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description In this paper, we explore the electrophysical and electroluminescence (EL)
 properties of thermally grown 350 nm thick SiO₂ layers co-implanted with Si⁺
 and C⁺
 ions. The implanting fluencies were chosen in such a way that the peak concentration of
 excess Si and C of 5-10 at.% were achieved. Effect of hydrogen plasma treatment on
 electroluminescence and durability of SiO2 (Si,C) - Si-system is studied. Combined
 measurements of charge trapping and EL intensity as a function of the injected charge
 and current have been carried out with the aim of clarifying the mechanisms of
 electroluminescence. EL was demonstrated to have defect-related nature. Cross-sections
 of both electron traps and hole traps were determined. EL quenching at great levels of
 injected charge is associated with strong negative charge capture, following capture of
 positive charge leading to electrical breakdown of SiO₂ structures.
first_indexed 2025-12-07T18:58:36Z
format Article
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id nasplib_isofts_kiev_ua-123456789-118612
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T18:58:36Z
publishDate 2009
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Nazarov, A.N.
Osiyuk, I.N.
Tiagulskyi, S.I.
Lysenko, V.S.
Tyagulskyy, I.P.
Torbin, V.N.
Omelchuk, V.V.
Nazarova, T.M.
Rebohle, L.
Skorupa, W.
2017-05-30T17:23:36Z
2017-05-30T17:23:36Z
2009
Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions / A.N. Nazarov, I.N. Osiyuk, S.I. Tiagulskyi, V.S. Lysenko, I.P. Tyagulskyy, V.N. Torbin, V.V. Omelchuk, T.M. Nazarova, L. Rebohle, W. Skorupa // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 1. — С. 98-104 — Бібліогр.: 26 назв. — англ.
1560-8034
PACS 68.35,78.55
https://nasplib.isofts.kiev.ua/handle/123456789/118612
In this paper, we explore the electrophysical and electroluminescence (EL)
 properties of thermally grown 350 nm thick SiO₂ layers co-implanted with Si⁺
 and C⁺
 ions. The implanting fluencies were chosen in such a way that the peak concentration of
 excess Si and C of 5-10 at.% were achieved. Effect of hydrogen plasma treatment on
 electroluminescence and durability of SiO2 (Si,C) - Si-system is studied. Combined
 measurements of charge trapping and EL intensity as a function of the injected charge
 and current have been carried out with the aim of clarifying the mechanisms of
 electroluminescence. EL was demonstrated to have defect-related nature. Cross-sections
 of both electron traps and hole traps were determined. EL quenching at great levels of
 injected charge is associated with strong negative charge capture, following capture of
 positive charge leading to electrical breakdown of SiO₂ structures.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
Article
published earlier
spellingShingle Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
Nazarov, A.N.
Osiyuk, I.N.
Tiagulskyi, S.I.
Lysenko, V.S.
Tyagulskyy, I.P.
Torbin, V.N.
Omelchuk, V.V.
Nazarova, T.M.
Rebohle, L.
Skorupa, W.
title Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
title_full Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
title_fullStr Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
title_full_unstemmed Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
title_short Erratum: Electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
title_sort erratum: electrical and light-emitting properties of silicon dioxide co-implanted by carbon and silicon ions
url https://nasplib.isofts.kiev.ua/handle/123456789/118612
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