Testing the optical methods by using the multi-level holographic grating

In this work the interaction peculiarities of electro-magnetic optical range radiation with gratings’ surfaces are investigated. The multilevel diffractive holographic grating is proposed to be used for the polarization optical methods testing. This object allowed to obtain simultaneous visualiza...

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Datum:2009
Hauptverfasser: Barchuk, О.I., Braginets, Y.V., Klimov, O.S., Oberemok, Y.A., Savenkov, S.N.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Schriftenreihe:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118614
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Testing the optical methods by using the multi-level holographic grating / О.I.Barchuk, Y.V.Braginets, O.S.Klimov, Y.A.Oberemok, S.N.Savenkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 1. — С. 57-63. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:In this work the interaction peculiarities of electro-magnetic optical range radiation with gratings’ surfaces are investigated. The multilevel diffractive holographic grating is proposed to be used for the polarization optical methods testing. This object allowed to obtain simultaneous visualization of different spatial frequencies and to estimate both structure and surface peculiarities when working with 3D-objects. Using this additional information one can remove uncertainty in solution of the inverse problem of ellipsometry related with ellipsometric angles periodicity. Thereby, multiangle ellipsometry allowing investigation of the specular reflection component could be used to study submicron peculiarities of the object. We have also presented the basic aspects of ellipsometric method optimization. It was shown that anisotropy parameters, such as linear amplitude anisotropy and linear phase anisotropy, obtained from ellipsometric measurements are the most effective to ascertain the submicron characteristic dimension of material.