Testing the optical methods by using the multi-level holographic grating

In this work the interaction peculiarities of electro-magnetic optical range
 radiation with gratings’ surfaces are investigated. The multilevel diffractive holographic
 grating is proposed to be used for the polarization optical methods testing. This object
 allowed to obtai...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2009
ISSN:1560-8034
Hauptverfasser: Barchuk, О.I., Braginets, Y.V., Klimov, O.S., Oberemok, Y.A., Savenkov, S.N.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118614
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Testing the optical methods by using the multi-level holographic grating / О.I.Barchuk, Y.V.Braginets, O.S.Klimov, Y.A.Oberemok, S.N.Savenkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 1. — С. 57-63. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:In this work the interaction peculiarities of electro-magnetic optical range
 radiation with gratings’ surfaces are investigated. The multilevel diffractive holographic
 grating is proposed to be used for the polarization optical methods testing. This object
 allowed to obtain simultaneous visualization of different spatial frequencies and to
 estimate both structure and surface peculiarities when working with 3D-objects. Using
 this additional information one can remove uncertainty in solution of the inverse problem
 of ellipsometry related with ellipsometric angles periodicity. Thereby, multiangle
 ellipsometry allowing investigation of the specular reflection component could be used to
 study submicron peculiarities of the object. We have also presented the basic aspects of
 ellipsometric method optimization. It was shown that anisotropy parameters, such as
 linear amplitude anisotropy and linear phase anisotropy, obtained from ellipsometric
 measurements are the most effective to ascertain the submicron characteristic dimension
 of material.
ISSN:1560-8034