New features of surface plasmon resonance detected by modulation of electromagnetic radiation polarization

• Опубліковано в: : Semiconductor Physics Quantum Electronics & Optoelectronics
• Дата: 2008
• Автори: Berezhinsky, L.J., Matyash, I.E., Rudenko, S.P., Serdega, B.K.
• Формат: Стаття
• Мова: Англійська
• Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2008
• Онлайн доступ: https://nasplib.isofts.kiev.ua/handle/123456789/118674
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: New features of surface plasmon resonance detected by modulation of electromagnetic radiation polarization / L.J. Berezhinsky, I.E. Matyash, S.P. Rudenko, B.К. Serdega // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 1. — С. 63-69. — Бібліогр.: 18 назв. — англ.

Using a technique based on modulation of electromagnetic radiation
 polarization, we studied the features of surface plasmon resonance in gold nanofilms
 deposited onto the surface of a totally reflecting prism (fused quartz). The angular
 characteristics of the polarization difference of squares of the reflectance coefficient
 modules for s- and p-polarized radiation,
 ∆ρ =|Rs|² − |Rp|² , were measured (at a wavelength
 λ = 0.63 µm) for metal films whose thickness varied from 0 up to 120 nm.
 Contrary to the results given by the traditional techniques, the characteristics of ∆ρ peak
 under the resonance condition. As a result, two nonresonance components were found in
 these characteristics. The values and shapes of their angular dependences are determined
 by the coefficients of internal reflection from the metal and insulator that depend on the
 film thickness. Application of a model with exponential dependence of the refraction and
 extinction coefficients on the metal film thickness led to agreement between the results
 of calculation from the Fresnel formulas and those obtained experimentally. It was found
 that characteristic parameter of the exponential corresponds to the metal film thickness
 value of 11±0.5 nm.