Mechanical scanning probe nanolithography: modeling and application
The paper presents a study on modeling the mechanical interaction between the tip of a
 scanning atomic force microscope (AFM) and surfaces of various types, which makes it
 possible to optimize parameters and modes for mechanical AFM nanolithography. The
 practical assessmen...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Datum: | 2012 |
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | Englisch |
| Veröffentlicht: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2012
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/118721 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Mechanical scanning probe nanolithography:
 modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862671696965664768 |
|---|---|
| author | Lytvyn, P.M. Lytvyn, O.S. Dyachyns’ka, O.M. Grytsenko, K.P. Schrader, S. Prokopenko, I.V. |
| author_facet | Lytvyn, P.M. Lytvyn, O.S. Dyachyns’ka, O.M. Grytsenko, K.P. Schrader, S. Prokopenko, I.V. |
| citation_txt | Mechanical scanning probe nanolithography:
 modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The paper presents a study on modeling the mechanical interaction between the tip of a
scanning atomic force microscope (AFM) and surfaces of various types, which makes it
possible to optimize parameters and modes for mechanical AFM nanolithography. The
practical assessment of mechanical nanoprobe lithography based on the method of a
direct surface patterning was carried out during fabrication of functional elements for
molecular electronics. Polymethine dye nanowires of a specified configuration and the
cross-section 3×20 nm have been successfully formed in a multilayer
polytetrafluoroethylene/gold/silicon nanostructure.
|
| first_indexed | 2025-12-07T15:33:57Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-118721 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-12-07T15:33:57Z |
| publishDate | 2012 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Lytvyn, P.M. Lytvyn, O.S. Dyachyns’ka, O.M. Grytsenko, K.P. Schrader, S. Prokopenko, I.V. 2017-05-31T05:16:38Z 2017-05-31T05:16:38Z 2012 Mechanical scanning probe nanolithography:
 modeling and application / P.M. Lytvyn, O.S. Lytvyn, O.M. Dyachyns’ka, K.P. Grytsenko, S. Schrader, I.V. Prokopenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 321-327. — Бібліогр.: 23 назв. — англ. 1560-8034 PACS 81.16.Nd https://nasplib.isofts.kiev.ua/handle/123456789/118721 The paper presents a study on modeling the mechanical interaction between the tip of a
 scanning atomic force microscope (AFM) and surfaces of various types, which makes it
 possible to optimize parameters and modes for mechanical AFM nanolithography. The
 practical assessment of mechanical nanoprobe lithography based on the method of a
 direct surface patterning was carried out during fabrication of functional elements for
 molecular electronics. Polymethine dye nanowires of a specified configuration and the
 cross-section 3×20 nm have been successfully formed in a multilayer
 polytetrafluoroethylene/gold/silicon nanostructure. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Mechanical scanning probe nanolithography: modeling and application Article published earlier |
| spellingShingle | Mechanical scanning probe nanolithography: modeling and application Lytvyn, P.M. Lytvyn, O.S. Dyachyns’ka, O.M. Grytsenko, K.P. Schrader, S. Prokopenko, I.V. |
| title | Mechanical scanning probe nanolithography: modeling and application |
| title_full | Mechanical scanning probe nanolithography: modeling and application |
| title_fullStr | Mechanical scanning probe nanolithography: modeling and application |
| title_full_unstemmed | Mechanical scanning probe nanolithography: modeling and application |
| title_short | Mechanical scanning probe nanolithography: modeling and application |
| title_sort | mechanical scanning probe nanolithography: modeling and application |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/118721 |
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