Perspectives for using technology of laser thermolithography

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2012
• Main Authors: Kryuchyn, A.A., Lapchuk, A.S., Bryts’kyi, A.I., Kostyukevych, S.O.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/118722
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Perspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ.

Analyzed in this work are the requirements to an optical system for laser
 thermolithographic recording. It has been shown that possibilities of this type recording
 with decreasing the registered element sizes can be realized only when using special
 measures for stabilizing both exposing radiation power and duration of laser pulses.
 Using the thermolithographic method for making super-dense patterns also requires
 creation of a specific system for dynamic focusing with accuracy better than 100 nm. It
 has been shown that the specific heat of thermochemical reaction and thermal resistance
 of a substrate are critical parameters for this method.