Photostimulated etching of germanium chalcogenide films

The new effect of photostimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated in detail. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge....

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2012
Main Authors: Dan’ko, V.A., Indutnyi, I.Z., Myn’ko, V.I., Shepeliavyi, P.E., Lukyanyuk, M.V., Litvin, O.S.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118724
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Photostimulated etching of germanium chalcogenide films / V.A. Dan’ko, I.Z. Indutnyi, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukyanyuk, O.S. Litvin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 345-350. — Бібліогр.: 27 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118724
record_format dspace
spelling Dan’ko, V.A.
Indutnyi, I.Z.
Myn’ko, V.I.
Shepeliavyi, P.E.
Lukyanyuk, M.V.
Litvin, O.S.
2017-05-31T05:19:50Z
2017-05-31T05:19:50Z
2012
Photostimulated etching of germanium chalcogenide films / V.A. Dan’ko, I.Z. Indutnyi, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukyanyuk, O.S. Litvin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 345-350. — Бібліогр.: 27 назв. — англ.
1560-8034
PACS 81.65.Cf
https://nasplib.isofts.kiev.ua/handle/123456789/118724
The new effect of photostimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated in detail. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. A possible mechanism for the photoinduced etching of ChG films has been discussed. The high-frequency diffraction gratings on germanium ChG – more environmentally acceptable compounds than traditionally used arsenic chalcogenides – were recorded using the method of interference immersion photolithography with photoinduced etching.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Photostimulated etching of germanium chalcogenide films
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Photostimulated etching of germanium chalcogenide films
spellingShingle Photostimulated etching of germanium chalcogenide films
Dan’ko, V.A.
Indutnyi, I.Z.
Myn’ko, V.I.
Shepeliavyi, P.E.
Lukyanyuk, M.V.
Litvin, O.S.
title_short Photostimulated etching of germanium chalcogenide films
title_full Photostimulated etching of germanium chalcogenide films
title_fullStr Photostimulated etching of germanium chalcogenide films
title_full_unstemmed Photostimulated etching of germanium chalcogenide films
title_sort photostimulated etching of germanium chalcogenide films
author Dan’ko, V.A.
Indutnyi, I.Z.
Myn’ko, V.I.
Shepeliavyi, P.E.
Lukyanyuk, M.V.
Litvin, O.S.
author_facet Dan’ko, V.A.
Indutnyi, I.Z.
Myn’ko, V.I.
Shepeliavyi, P.E.
Lukyanyuk, M.V.
Litvin, O.S.
publishDate 2012
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The new effect of photostimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated in detail. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. A possible mechanism for the photoinduced etching of ChG films has been discussed. The high-frequency diffraction gratings on germanium ChG – more environmentally acceptable compounds than traditionally used arsenic chalcogenides – were recorded using the method of interference immersion photolithography with photoinduced etching.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118724
citation_txt Photostimulated etching of germanium chalcogenide films / V.A. Dan’ko, I.Z. Indutnyi, V.I. Myn’ko, P.E. Shepeliavyi, M.V. Lukyanyuk, O.S. Litvin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 345-350. — Бібліогр.: 27 назв. — англ.
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