On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors

Within the frame of theory of anisotropic scattering, it was studied the relation of values for specific resistance changes under the axial elastic deformations for manyvalley semiconductors, n-Ge and n-Si. The aspect ratio between values of the saturated specific resistance ρX (∞)strain for s...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2009
1. Verfasser: Gaidar, G.P.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2009
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118830
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 324-327. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118830
record_format dspace
spelling Gaidar, G.P.
2017-05-31T18:43:44Z
2017-05-31T18:43:44Z
2009
On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 324-327. — Бібліогр.: 7 назв. — англ.
1560-8034
PACS 73.20.Mf, 78.67.Bf
https://nasplib.isofts.kiev.ua/handle/123456789/118830
Within the frame of theory of anisotropic scattering, it was studied the relation of values for specific resistance changes under the axial elastic deformations for manyvalley semiconductors, n-Ge and n-Si. The aspect ratio between values of the saturated specific resistance ρX (∞)strain for strain and analogous value for axial pressure deformation ρX (∞)pressure was determined. It gives a possibility to obtain reliable information concerning the value ρX (∞)strain even for the case when mobility of carriers and, consequently, the value ρ = ρ(Х) are significantly decreased, for example, under irradiation treatment of crystals.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
spellingShingle On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
Gaidar, G.P.
title_short On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
title_full On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
title_fullStr On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
title_full_unstemmed On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
title_sort on methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors
author Gaidar, G.P.
author_facet Gaidar, G.P.
publishDate 2009
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Within the frame of theory of anisotropic scattering, it was studied the relation of values for specific resistance changes under the axial elastic deformations for manyvalley semiconductors, n-Ge and n-Si. The aspect ratio between values of the saturated specific resistance ρX (∞)strain for strain and analogous value for axial pressure deformation ρX (∞)pressure was determined. It gives a possibility to obtain reliable information concerning the value ρX (∞)strain even for the case when mobility of carriers and, consequently, the value ρ = ρ(Х) are significantly decreased, for example, under irradiation treatment of crystals.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118830
citation_txt On methodology of measuring parameters with the increased sensitivity to residual or irradiation induced inhomogeneities in semiconductors / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2009. — Т. 12, № 4. — С. 324-327. — Бібліогр.: 7 назв. — англ.
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last_indexed 2025-12-07T15:47:31Z
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