Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase

The work has suggested an adequate model describing formation of defects in films of AIVBVI compounds in vapor-phase growth. Being based on this model, it has given an analytical description of dependences for film electrophysical parameters (concentrations n, p and mobilities µn, µp of free char...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2008
Hauptverfasser: Saliy, Ya.P., Freik, I.M., Prokopiv (Jr), V.V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2008
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118850
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase / Ya.P. Saliy, І.М. Freik, V.V. Prokopiv (Jr) // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 2. — С. 167-170. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118850
record_format dspace
spelling Saliy, Ya.P.
Freik, I.M.
Prokopiv (Jr), V.V.
2017-05-31T19:23:31Z
2017-05-31T19:23:31Z
2008
Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase / Ya.P. Saliy, І.М. Freik, V.V. Prokopiv (Jr) // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 2. — С. 167-170. — Бібліогр.: 6 назв. — англ.
1560-8034
PACS 71.20.Nr, 71.55.-i, 81.15.Aa
https://nasplib.isofts.kiev.ua/handle/123456789/118850
The work has suggested an adequate model describing formation of defects in films of AIVBVI compounds in vapor-phase growth. Being based on this model, it has given an analytical description of dependences for film electrophysical parameters (concentrations n, p and mobilities µn, µp of free charge carriers) on technological factors of film growth. We have calculated concentrations of activated and inactivated defects as subject to temperature of film deposition. The developed model enables determination of entropy and enthalpy of defect formation processes.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
spellingShingle Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
Saliy, Ya.P.
Freik, I.M.
Prokopiv (Jr), V.V.
title_short Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
title_full Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
title_fullStr Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
title_full_unstemmed Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase
title_sort formation and activation of defects in films of aivbvi compounds in the process of growing from vapor phase
author Saliy, Ya.P.
Freik, I.M.
Prokopiv (Jr), V.V.
author_facet Saliy, Ya.P.
Freik, I.M.
Prokopiv (Jr), V.V.
publishDate 2008
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The work has suggested an adequate model describing formation of defects in films of AIVBVI compounds in vapor-phase growth. Being based on this model, it has given an analytical description of dependences for film electrophysical parameters (concentrations n, p and mobilities µn, µp of free charge carriers) on technological factors of film growth. We have calculated concentrations of activated and inactivated defects as subject to temperature of film deposition. The developed model enables determination of entropy and enthalpy of defect formation processes.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118850
citation_txt Formation and activation of defects in films of AIVBVI compounds in the process of growing from vapor phase / Ya.P. Saliy, І.М. Freik, V.V. Prokopiv (Jr) // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2008. — Т. 11, № 2. — С. 167-170. — Бібліогр.: 6 назв. — англ.
work_keys_str_mv AT saliyyap formationandactivationofdefectsinfilmsofaivbvicompoundsintheprocessofgrowingfromvaporphase
AT freikim formationandactivationofdefectsinfilmsofaivbvicompoundsintheprocessofgrowingfromvaporphase
AT prokopivjrvv formationandactivationofdefectsinfilmsofaivbvicompoundsintheprocessofgrowingfromvaporphase
first_indexed 2025-12-07T13:11:58Z
last_indexed 2025-12-07T13:11:58Z
_version_ 1850855253686091776