TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment

The investigations of TiB₂/GaAs and Au-TiB₂/GaAs structural characteristics in dependence on technological regimes of sputtering and TiB2-film thicknesses as well as structural relaxation processes at short-term thermal annealing were carried out. TiB₂-film on Czochralski-grown (001) GaAs substrates...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:1999
Main Authors: Kryshtab, T.G., Lytvyn, P.M., Mazin, M.O., Lytvyn, O.S., Prokopenko, I.V., Ivanov, V.N.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1999
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/119063
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment / T.G. Kryshtab, P.M. Lytvyn, M.O. Mazin, O.S. Lytvyn, I.V. Prokopenko, V.N. Ivanov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 73-77. — Бібліогр.: 8 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-119063
record_format dspace
spelling Kryshtab, T.G.
Lytvyn, P.M.
Mazin, M.O.
Lytvyn, O.S.
Prokopenko, I.V.
Ivanov, V.N.
2017-06-03T04:56:07Z
2017-06-03T04:56:07Z
1999
TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment / T.G. Kryshtab, P.M. Lytvyn, M.O. Mazin, O.S. Lytvyn, I.V. Prokopenko, V.N. Ivanov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 73-77. — Бібліогр.: 8 назв. — англ.
1560-8034
PACS 61.72.Cc, 61.72.Vv
https://nasplib.isofts.kiev.ua/handle/123456789/119063
The investigations of TiB₂/GaAs and Au-TiB₂/GaAs structural characteristics in dependence on technological regimes of sputtering and TiB2-film thicknesses as well as structural relaxation processes at short-term thermal annealing were carried out. TiB₂-film on Czochralski-grown (001) GaAs substrates were prepared by the magnetron sputtering in argon atmosphere at growth velocity ~ 5 Е/s and film thicknesses ranging from 10 to 50 nm. Samples were annealed during 1 min at 400, 600 and 800 °C. By using X-ray diffraction methods, it was shown that at our experimental conditions the magnetron sputtering of titanium diboride film causes the titanium and boron solid solutions formation as well as formation of some other phases within an interface region. At short-term thermal annealing the relaxation of mechanical strains, decay of solid solutions, generation of dislocations and their propagation as well as point defects redistribution take place. The processes of structural ordering have non-monotonous temperature dependence and differ for various types of structures.
The work was supported by the Ukrainian Scientific and Technological Center (project №464).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
spellingShingle TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
Kryshtab, T.G.
Lytvyn, P.M.
Mazin, M.O.
Lytvyn, O.S.
Prokopenko, I.V.
Ivanov, V.N.
title_short TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
title_full TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
title_fullStr TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
title_full_unstemmed TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment
title_sort tib₂/gaas and au-tib₂/gaas structural transformations at short-term thermal treatment
author Kryshtab, T.G.
Lytvyn, P.M.
Mazin, M.O.
Lytvyn, O.S.
Prokopenko, I.V.
Ivanov, V.N.
author_facet Kryshtab, T.G.
Lytvyn, P.M.
Mazin, M.O.
Lytvyn, O.S.
Prokopenko, I.V.
Ivanov, V.N.
publishDate 1999
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The investigations of TiB₂/GaAs and Au-TiB₂/GaAs structural characteristics in dependence on technological regimes of sputtering and TiB2-film thicknesses as well as structural relaxation processes at short-term thermal annealing were carried out. TiB₂-film on Czochralski-grown (001) GaAs substrates were prepared by the magnetron sputtering in argon atmosphere at growth velocity ~ 5 Е/s and film thicknesses ranging from 10 to 50 nm. Samples were annealed during 1 min at 400, 600 and 800 °C. By using X-ray diffraction methods, it was shown that at our experimental conditions the magnetron sputtering of titanium diboride film causes the titanium and boron solid solutions formation as well as formation of some other phases within an interface region. At short-term thermal annealing the relaxation of mechanical strains, decay of solid solutions, generation of dislocations and their propagation as well as point defects redistribution take place. The processes of structural ordering have non-monotonous temperature dependence and differ for various types of structures.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/119063
citation_txt TiB₂/GaAs and Au-TiB₂/GaAs structural transformations at short-term thermal treatment / T.G. Kryshtab, P.M. Lytvyn, M.O. Mazin, O.S. Lytvyn, I.V. Prokopenko, V.N. Ivanov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 73-77. — Бібліогр.: 8 назв. — англ.
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