Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 1999
• Hauptverfasser: Volodin, N.M., Zavyalova, L.V., Kirillov, A.I., Svechnikov, S.V., Prokopenko, I.V., Khanova, A.V.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1999
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/119064
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Investigation of growth conditions, crystal structure and surface morphology of SmS films fabricated by MOCVD technique / N.M. Volodin, L.V. Zavyalova, A.I. Kirillov, S.V. Svechnikov, I.V. Prokopenko, A.V. Khanova // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 78-83. — Бібліогр.: 9 назв. — англ.

The polycrystalline SmS films were fabricated by MOCVD technique using a number of ditiocarbamates, synthesized by different techniques. The growth kinetics and temperature dependencies of the film growth rate are investigated, which allowed us to determine the activation energies and the reaction t...