Increase of planar homogeneity of multi-silicon structures by gettering treatments

Two types of gettering treatments are considered and compared from the viewpoint of their usefulness to decrease LD scatter over the wafer in multi-silicon photovoltaic structures. It was found that in both cases high degree of homogeneity in LD distribution over the sample surface and cleaning of t...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2001
Hauptverfasser: Litovchenko, V.G., Efremov, A.A., Evtukh, A.A., Rassamakin, Yu.V., Klyui, M.I., Kostylov, V.P.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/119249
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Increase of planar homogeneity of multi-silicon structures by gettering treatments / V.G. Litovchenko, A.A. Efremov, A.A. Evtukh, Yu.V. Rassamakin, M.I. Klyui, V.P. Kostylov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 2. — С. 82-84. — Бібліогр.: 1 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-119249
record_format dspace
spelling Litovchenko, V.G.
Efremov, A.A.
Evtukh, A.A.
Rassamakin, Yu.V.
Klyui, M.I.
Kostylov, V.P.
2017-06-05T16:33:47Z
2017-06-05T16:33:47Z
2001
Increase of planar homogeneity of multi-silicon structures by gettering treatments / V.G. Litovchenko, A.A. Efremov, A.A. Evtukh, Yu.V. Rassamakin, M.I. Klyui, V.P. Kostylov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 2. — С. 82-84. — Бібліогр.: 1 назв. — англ.
1560-8034
PACS: 61.72.Y; 72.40; 81.05.C; 81.65.T
https://nasplib.isofts.kiev.ua/handle/123456789/119249
Two types of gettering treatments are considered and compared from the viewpoint of their usefulness to decrease LD scatter over the wafer in multi-silicon photovoltaic structures. It was found that in both cases high degree of homogeneity in LD distribution over the sample surface and cleaning of the samples from recombination active impurities are achieved. Possible mechanisms of the homogenization are briefly discussed.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Increase of planar homogeneity of multi-silicon structures by gettering treatments
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Increase of planar homogeneity of multi-silicon structures by gettering treatments
spellingShingle Increase of planar homogeneity of multi-silicon structures by gettering treatments
Litovchenko, V.G.
Efremov, A.A.
Evtukh, A.A.
Rassamakin, Yu.V.
Klyui, M.I.
Kostylov, V.P.
title_short Increase of planar homogeneity of multi-silicon structures by gettering treatments
title_full Increase of planar homogeneity of multi-silicon structures by gettering treatments
title_fullStr Increase of planar homogeneity of multi-silicon structures by gettering treatments
title_full_unstemmed Increase of planar homogeneity of multi-silicon structures by gettering treatments
title_sort increase of planar homogeneity of multi-silicon structures by gettering treatments
author Litovchenko, V.G.
Efremov, A.A.
Evtukh, A.A.
Rassamakin, Yu.V.
Klyui, M.I.
Kostylov, V.P.
author_facet Litovchenko, V.G.
Efremov, A.A.
Evtukh, A.A.
Rassamakin, Yu.V.
Klyui, M.I.
Kostylov, V.P.
publishDate 2001
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Two types of gettering treatments are considered and compared from the viewpoint of their usefulness to decrease LD scatter over the wafer in multi-silicon photovoltaic structures. It was found that in both cases high degree of homogeneity in LD distribution over the sample surface and cleaning of the samples from recombination active impurities are achieved. Possible mechanisms of the homogenization are briefly discussed.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/119249
citation_txt Increase of planar homogeneity of multi-silicon structures by gettering treatments / V.G. Litovchenko, A.A. Efremov, A.A. Evtukh, Yu.V. Rassamakin, M.I. Klyui, V.P. Kostylov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 2. — С. 82-84. — Бібліогр.: 1 назв. — англ.
work_keys_str_mv AT litovchenkovg increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
AT efremovaa increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
AT evtukhaa increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
AT rassamakinyuv increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
AT klyuimi increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
AT kostylovvp increaseofplanarhomogeneityofmultisiliconstructuresbygetteringtreatments
first_indexed 2025-12-01T02:10:49Z
last_indexed 2025-12-01T02:10:49Z
_version_ 1850859082244685824