Low-temperature growth of diamond films using supersonic DC arcjet

Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperatu...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2001
Hauptverfasser: Romanyuk, A., Gottler, H., Popov, V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/119272
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-119272
record_format dspace
spelling Romanyuk, A.
Gottler, H.
Popov, V.
2017-06-05T17:18:12Z
2017-06-05T17:18:12Z
2001
Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ.
1560-8034
PACS: 68.55, 78.30, 81.15
https://nasplib.isofts.kiev.ua/handle/123456789/119272
Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperature on the diamond growth rate and the diamond quality. The quality of the deposited diamond films was controlled with Raman spectroscopy. It was shown that using methane as hydrocarbon source the growth rate up to 1.5 μm/h can be achieved. The use of ethane leads to the lower growth rate, but the quality of diamond film, crystallite morphology are better. Decrease of the substrate temperature down to 180°C leads to smaller grain size as well as to decreasing of diamond impact in the film.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Low-temperature growth of diamond films using supersonic DC arcjet
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Low-temperature growth of diamond films using supersonic DC arcjet
spellingShingle Low-temperature growth of diamond films using supersonic DC arcjet
Romanyuk, A.
Gottler, H.
Popov, V.
title_short Low-temperature growth of diamond films using supersonic DC arcjet
title_full Low-temperature growth of diamond films using supersonic DC arcjet
title_fullStr Low-temperature growth of diamond films using supersonic DC arcjet
title_full_unstemmed Low-temperature growth of diamond films using supersonic DC arcjet
title_sort low-temperature growth of diamond films using supersonic dc arcjet
author Romanyuk, A.
Gottler, H.
Popov, V.
author_facet Romanyuk, A.
Gottler, H.
Popov, V.
publishDate 2001
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperature on the diamond growth rate and the diamond quality. The quality of the deposited diamond films was controlled with Raman spectroscopy. It was shown that using methane as hydrocarbon source the growth rate up to 1.5 μm/h can be achieved. The use of ethane leads to the lower growth rate, but the quality of diamond film, crystallite morphology are better. Decrease of the substrate temperature down to 180°C leads to smaller grain size as well as to decreasing of diamond impact in the film.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/119272
fulltext
citation_txt Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ.
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AT gottlerh lowtemperaturegrowthofdiamondfilmsusingsupersonicdcarcjet
AT popovv lowtemperaturegrowthofdiamondfilmsusingsupersonicdcarcjet
first_indexed 2025-11-24T04:20:49Z
last_indexed 2025-11-24T04:20:49Z
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