Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...
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| Опубліковано в: : | Functional Materials |
|---|---|
| Дата: | 2015 |
| Автор: | |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2015
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| Теми: | |
| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/119306 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862684054213623808 |
|---|---|
| author | Vovk, E.A. |
| author_facet | Vovk, E.A. |
| citation_txt | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. |
| collection | DSpace DC |
| container_title | Functional Materials |
| description | Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830.
|
| first_indexed | 2025-12-07T15:57:18Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-119306 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1027-5495 |
| language | English |
| last_indexed | 2025-12-07T15:57:18Z |
| publishDate | 2015 |
| publisher | НТК «Інститут монокристалів» НАН України |
| record_format | dspace |
| spelling | Vovk, E.A. 2017-06-05T19:14:19Z 2017-06-05T19:14:19Z 2015 Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. 1027-5495 DOI: http://dx.doi.org/10.15407/fm22.01.110 https://nasplib.isofts.kiev.ua/handle/123456789/119306 Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830. en НТК «Інститут монокристалів» НАН України Functional Materials Technology Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire Article published earlier |
| spellingShingle | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire Vovk, E.A. Technology |
| title | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| title_full | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| title_fullStr | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| title_full_unstemmed | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| title_short | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| title_sort | deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire |
| topic | Technology |
| topic_facet | Technology |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/119306 |
| work_keys_str_mv | AT vovkea deagglomerationofaerosilinpolishingsuspensionforchemicalmechanicalpolishingofsapphire |