Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire
Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...
Saved in:
| Published in: | Functional Materials |
|---|---|
| Date: | 2015 |
| Main Author: | Vovk, E.A. |
| Format: | Article |
| Language: | English |
| Published: |
НТК «Інститут монокристалів» НАН України
2015
|
| Subjects: | |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/119306 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of UkraineSimilar Items
-
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil
by: Vovk, E.A.
Published: (2015) -
Anisotropy of sapphire properties associated with chemical-mechanical polishing with silica
by: Budnikov, A.T., et al.
Published: (2010) -
Polishing of AlN/sapphire substrates obtained by thermochemical nitridation of sapphire
by: Vovk, E.A., et al.
Published: (2013) -
Polishing substrates of single crystal silicon carbide and sapphire for optoelectronics
by: Filatov, O.Yu., et al.
Published: (2016) -
Investigation of residual stresses in sapphire plates after grinding and polishing
by: Budnikov, A.T., et al.
Published: (2012)