Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire

• Published in: Functional Materials
• Date: 2015
• Main Author: Vovk, E.A.
• Format: Article
• Language: English
• Published: НТК «Інститут монокристалів» НАН України 2015
• Subjects: Technology
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/119306
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 1. — С. 110-115. — Бібліогр.: 15 назв. — англ.

Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obta...