Investigation of ArF* excimer laser VUV radiation action on sapphire

Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as...

Повний опис

Збережено в:
Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2001
Автори: Baschenko, S.M., Gochelashvili, K.S., Zakirov, R.M., Klimov, V.I., Mikhkelsoo, V.T., Prokhorov, O.M.
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/119330
Теги: Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
_version_ 1862588313063391232
author Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
author_facet Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
citation_txt Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as their distribution on velocities in the flow are measured. Determined is also the temperature and velocity of aluminium atoms. It is ascertained that within the range of used energy densities of 0.45 to 1.0 J/cm² extraction of materials can be made in three regimes, namely: the ablation, the plasma and mixed ones, intertransitions between them being of a cyclic character.
first_indexed 2025-11-27T00:36:00Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-119330
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-27T00:36:00Z
publishDate 2001
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
2017-06-06T13:05:18Z
2017-06-06T13:05:18Z
2001
Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ.
1560-8034
PACS: 32.50; 42.55.L; 79.20.D
https://nasplib.isofts.kiev.ua/handle/123456789/119330
Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as their distribution on velocities in the flow are measured. Determined is also the temperature and velocity of aluminium atoms. It is ascertained that within the range of used energy densities of 0.45 to 1.0 J/cm² extraction of materials can be made in three regimes, namely: the ablation, the plasma and mixed ones, intertransitions between them being of a cyclic character.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Investigation of ArF* excimer laser VUV radiation action on sapphire
Article
published earlier
spellingShingle Investigation of ArF* excimer laser VUV radiation action on sapphire
Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
title Investigation of ArF* excimer laser VUV radiation action on sapphire
title_full Investigation of ArF* excimer laser VUV radiation action on sapphire
title_fullStr Investigation of ArF* excimer laser VUV radiation action on sapphire
title_full_unstemmed Investigation of ArF* excimer laser VUV radiation action on sapphire
title_short Investigation of ArF* excimer laser VUV radiation action on sapphire
title_sort investigation of arf* excimer laser vuv radiation action on sapphire
url https://nasplib.isofts.kiev.ua/handle/123456789/119330
work_keys_str_mv AT baschenkosm investigationofarfexcimerlaservuvradiationactiononsapphire
AT gochelashviliks investigationofarfexcimerlaservuvradiationactiononsapphire
AT zakirovrm investigationofarfexcimerlaservuvradiationactiononsapphire
AT klimovvi investigationofarfexcimerlaservuvradiationactiononsapphire
AT mikhkelsoovt investigationofarfexcimerlaservuvradiationactiononsapphire
AT prokhorovom investigationofarfexcimerlaservuvradiationactiononsapphire