Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy

Surface plasmon resonance (SPR) was first applied for investigation of the initial stage kinetics of the chemical processes in inorganic resist based on thin-film Ag-As₂S₃ structure. This method enabled to measure optical constants for the super-thin layers (from 0.2 up to 50 nm) and to study the ch...

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Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2001
Автори: Chegel’, V.I., Shirshov, Yu.M., Kostyukevich, S.O., Shepeliavy, P.E., Chegel', Yu.V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/119333
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy / V.I. Chegel’, Yu.M. Shirshov, S.O. Kostyukevich, P.E. Shepeliavy, Yu.V. Chegel’ // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 301-308. — Бібліогр.: 17 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-119333
record_format dspace
spelling Chegel’, V.I.
Shirshov, Yu.M.
Kostyukevich, S.O.
Shepeliavy, P.E.
Chegel', Yu.V.
2017-06-06T13:16:31Z
2017-06-06T13:16:31Z
2001
Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy / V.I. Chegel’, Yu.M. Shirshov, S.O. Kostyukevich, P.E. Shepeliavy, Yu.V. Chegel’ // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 301-308. — Бібліогр.: 17 назв. — англ.
1560-8034
PACS: 68.55; 73.50; 78.66; 81.15
https://nasplib.isofts.kiev.ua/handle/123456789/119333
Surface plasmon resonance (SPR) was first applied for investigation of the initial stage kinetics of the chemical processes in inorganic resist based on thin-film Ag-As₂S₃ structure. This method enabled to measure optical constants for the super-thin layers (from 0.2 up to 50 nm) and to study the changes in structure and thickness of the films after their exposure with different doses of UV radiation. Computer matching of the experimentally obtained SPR curves enabled to justify the assumption concerning the presence of a thin (close to 0.7-1 nm) intermediate layer with the parameters similar to Ag₂S, which is created during formation of the Ag-As₂S₃ structure, and also estimate its evolution in the course of layers interaction.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
spellingShingle Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
Chegel’, V.I.
Shirshov, Yu.M.
Kostyukevich, S.O.
Shepeliavy, P.E.
Chegel', Yu.V.
title_short Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
title_full Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
title_fullStr Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
title_full_unstemmed Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy
title_sort experimental investigations and computer modeling of the photochemical processes in ag-as₂s₃ structures using surface plasmon resonance spectroscopy
author Chegel’, V.I.
Shirshov, Yu.M.
Kostyukevich, S.O.
Shepeliavy, P.E.
Chegel', Yu.V.
author_facet Chegel’, V.I.
Shirshov, Yu.M.
Kostyukevich, S.O.
Shepeliavy, P.E.
Chegel', Yu.V.
publishDate 2001
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Surface plasmon resonance (SPR) was first applied for investigation of the initial stage kinetics of the chemical processes in inorganic resist based on thin-film Ag-As₂S₃ structure. This method enabled to measure optical constants for the super-thin layers (from 0.2 up to 50 nm) and to study the changes in structure and thickness of the films after their exposure with different doses of UV radiation. Computer matching of the experimentally obtained SPR curves enabled to justify the assumption concerning the presence of a thin (close to 0.7-1 nm) intermediate layer with the parameters similar to Ag₂S, which is created during formation of the Ag-As₂S₃ structure, and also estimate its evolution in the course of layers interaction.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/119333
citation_txt Experimental investigations and computer modeling of the photochemical processes in Ag-As₂S₃ structures using surface plasmon resonance spectroscopy / V.I. Chegel’, Yu.M. Shirshov, S.O. Kostyukevich, P.E. Shepeliavy, Yu.V. Chegel’ // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 301-308. — Бібліогр.: 17 назв. — англ.
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AT kostyukevichso experimentalinvestigationsandcomputermodelingofthephotochemicalprocessesinagas2s3structuresusingsurfaceplasmonresonancespectroscopy
AT shepeliavype experimentalinvestigationsandcomputermodelingofthephotochemicalprocessesinagas2s3structuresusingsurfaceplasmonresonancespectroscopy
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first_indexed 2025-11-30T21:55:41Z
last_indexed 2025-11-30T21:55:41Z
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