Investigation of the photoelastic effect in si at high values of the absorptivity

The birefrigence effect induced by uniaxial elastic deformation has been investigated in monocrystalline Si using theoretical and experimental technigues. To improve a measuring system sensitivity in the range of band absorption, polarization modulation of reffected emission was used. Deformation ch...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:1999
Hauptverfasser: Boiko, I.I., Venger, Ye.F., Nikitenko, E.V., Serdega, B.K.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1999
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/119860
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Investigation of the photoelastic effect in si at high values of the absorptivity / I.I. Boiko, Ye.F. Venger, E.V. Nikitenko, B.K. Serdega // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 54-58. — Бібліогр.: 8 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
_version_ 1862665870259519488
author Boiko, I.I.
Venger, Ye.F.
Nikitenko, E.V.
Serdega, B.K.
author_facet Boiko, I.I.
Venger, Ye.F.
Nikitenko, E.V.
Serdega, B.K.
citation_txt Investigation of the photoelastic effect in si at high values of the absorptivity / I.I. Boiko, Ye.F. Venger, E.V. Nikitenko, B.K. Serdega // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 54-58. — Бібліогр.: 8 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The birefrigence effect induced by uniaxial elastic deformation has been investigated in monocrystalline Si using theoretical and experimental technigues. To improve a measuring system sensitivity in the range of band absorption, polarization modulation of reffected emission was used. Deformation characteristics of this effect has been measured. The main results obtained for probing light wavelengths from the range of crystal transparency are in a good accordance with conclusions of previons studies. In the range of strong absorption, a considerable change of effect characteristic shapes was found, and their satisfactory accordance with results of theoretical estimations was also ascertained.
first_indexed 2025-12-07T15:18:18Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-119860
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T15:18:18Z
publishDate 1999
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Boiko, I.I.
Venger, Ye.F.
Nikitenko, E.V.
Serdega, B.K.
2017-06-10T07:45:35Z
2017-06-10T07:45:35Z
1999
Investigation of the photoelastic effect in si at high values of the absorptivity / I.I. Boiko, Ye.F. Venger, E.V. Nikitenko, B.K. Serdega // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 2. — С. 54-58. — Бібліогр.: 8 назв. — англ.
1560-8034
PACS 78.20.C
https://nasplib.isofts.kiev.ua/handle/123456789/119860
The birefrigence effect induced by uniaxial elastic deformation has been investigated in monocrystalline Si using theoretical and experimental technigues. To improve a measuring system sensitivity in the range of band absorption, polarization modulation of reffected emission was used. Deformation characteristics of this effect has been measured. The main results obtained for probing light wavelengths from the range of crystal transparency are in a good accordance with conclusions of previons studies. In the range of strong absorption, a considerable change of effect characteristic shapes was found, and their satisfactory accordance with results of theoretical estimations was also ascertained.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Investigation of the photoelastic effect in si at high values of the absorptivity
Article
published earlier
spellingShingle Investigation of the photoelastic effect in si at high values of the absorptivity
Boiko, I.I.
Venger, Ye.F.
Nikitenko, E.V.
Serdega, B.K.
title Investigation of the photoelastic effect in si at high values of the absorptivity
title_full Investigation of the photoelastic effect in si at high values of the absorptivity
title_fullStr Investigation of the photoelastic effect in si at high values of the absorptivity
title_full_unstemmed Investigation of the photoelastic effect in si at high values of the absorptivity
title_short Investigation of the photoelastic effect in si at high values of the absorptivity
title_sort investigation of the photoelastic effect in si at high values of the absorptivity
url https://nasplib.isofts.kiev.ua/handle/123456789/119860
work_keys_str_mv AT boikoii investigationofthephotoelasticeffectinsiathighvaluesoftheabsorptivity
AT vengeryef investigationofthephotoelasticeffectinsiathighvaluesoftheabsorptivity
AT nikitenkoev investigationofthephotoelasticeffectinsiathighvaluesoftheabsorptivity
AT serdegabk investigationofthephotoelasticeffectinsiathighvaluesoftheabsorptivity