Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe

The dependence of the conversion depth in CdxHg₁–xTe alloys subjected to ion-beam milling (CMT) on alloy composition and treatment temperature is studied both experimentally and theoretically. It is shown that in compositionally homogeneous crystals the dependence is defined by internal electric fie...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2005
Main Authors: Izhnin, I.I., Bogoboyashchyy, V.V., Kurbanov, K.R., Mynbaev, K.D., Ryabikov, V.M.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/119965
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe / I.I. Izhnin, V.V. Bogoboyashchyy, K.R. Kurbanov, K.D. Mynbaev, V.M. Ryabikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 1. — С. 53-59. — Бібліогр.: 19 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Izhnin, I.I.
Bogoboyashchyy, V.V.
Kurbanov, K.R.
Mynbaev, K.D.
Ryabikov, V.M.
author_facet Izhnin, I.I.
Bogoboyashchyy, V.V.
Kurbanov, K.R.
Mynbaev, K.D.
Ryabikov, V.M.
citation_txt Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe / I.I. Izhnin, V.V. Bogoboyashchyy, K.R. Kurbanov, K.D. Mynbaev, V.M. Ryabikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 1. — С. 53-59. — Бібліогр.: 19 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description The dependence of the conversion depth in CdxHg₁–xTe alloys subjected to ion-beam milling (CMT) on alloy composition and treatment temperature is studied both experimentally and theoretically. It is shown that in compositionally homogeneous crystals the dependence is defined by internal electric fields, which affect the diffusion of charged intrinsic defects that arise as a result of the treatment. The results of calculations of the effect of the potentials of the p-n junction formed by ion-milling on the conversion depth fit well both the original experimental data and those taken from the literature. The data obtained confirm the validity of the diffusion model of the formation of the excessive mercury source in CMT subjected to ion-beam milling, which was proposed by the authors earlier. The results gained allow one to precisely predict and control the conversion depth in CMT crystals and epitaxial layers subjected to ion milling for p-n junction fabrication. This makes the results presented in the paper useful in CMT infrared detector technology.
first_indexed 2025-11-30T17:38:02Z
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-30T17:38:02Z
publishDate 2005
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Izhnin, I.I.
Bogoboyashchyy, V.V.
Kurbanov, K.R.
Mynbaev, K.D.
Ryabikov, V.M.
2017-06-10T13:47:41Z
2017-06-10T13:47:41Z
2005
Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe / I.I. Izhnin, V.V. Bogoboyashchyy, K.R. Kurbanov, K.D. Mynbaev, V.M. Ryabikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 1. — С. 53-59. — Бібліогр.: 19 назв. — англ.
1560-8034
PACS: 73.61Ga, 61.72Vv, 61.80.Jh, 66.30Jt
https://nasplib.isofts.kiev.ua/handle/123456789/119965
The dependence of the conversion depth in CdxHg₁–xTe alloys subjected to ion-beam milling (CMT) on alloy composition and treatment temperature is studied both experimentally and theoretically. It is shown that in compositionally homogeneous crystals the dependence is defined by internal electric fields, which affect the diffusion of charged intrinsic defects that arise as a result of the treatment. The results of calculations of the effect of the potentials of the p-n junction formed by ion-milling on the conversion depth fit well both the original experimental data and those taken from the literature. The data obtained confirm the validity of the diffusion model of the formation of the excessive mercury source in CMT subjected to ion-beam milling, which was proposed by the authors earlier. The results gained allow one to precisely predict and control the conversion depth in CMT crystals and epitaxial layers subjected to ion milling for p-n junction fabrication. This makes the results presented in the paper useful in CMT infrared detector technology.
These investigations were partly supported by the
 Ministry of Education and Science of Ukraine.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
Article
published earlier
spellingShingle Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
Izhnin, I.I.
Bogoboyashchyy, V.V.
Kurbanov, K.R.
Mynbaev, K.D.
Ryabikov, V.M.
title Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
title_full Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
title_fullStr Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
title_full_unstemmed Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
title_short Effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-CdxHg₁₋xTe
title_sort effect of internal electrical field on compositional dependence of p-n junction depth in ion milled p-cdxhg₁₋xte
url https://nasplib.isofts.kiev.ua/handle/123456789/119965
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