Morphology change of the silicon surface induced by Ar+ ion beam sputtering
Two-level modeling for nanoscale pattern formation on silicon target by Ar+ ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roug...
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| Date: | 2011 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Інститут фізики конденсованих систем НАН України
2011
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| Series: | Condensed Matter Physics |
| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/119981 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Morphology change of the silicon surface induced by Ar+ ion beam sputtering / V.O. Kharchenko, D.O. Kharchenko // Condensed Matter Physics. — 2011. — Т. 14, № 2. — С. 23602:1-11. — Бібліогр.: 27 назв. — англ. |