Formation and thermal stability of NiSi phase in Ni (30 nm)/Pt (2 nm; 6 nm)/Siep. (50 nm)/Si (001) thin film systems

• Veröffentlicht in: Functional Materials
• Datum: 2013
• Hauptverfasser: Makogon, Iu.N., Pavlova, E.P., Sidorenko, S.I., Beddies, G., Beke, D.L., Csik, A., Verbitska, T.I., Fihurna, E.V., Shkarban, R.A.
• Format: Artikel
• Sprache: English
• Veröffentlicht: НТК «Інститут монокристалів» НАН України 2013
• Schlagworte: Characterization and properties
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/120090
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Formation and thermal stability of NiSi phase in Ni (30 nm)/Pt (2 nm; 6 nm)/Siep. (50 nm)/Si (001) thin film systems / Iu.N. Makogon, E.P. Pavlova, S.I. Sidorenko, G. Beddies, D.L. Beke, A. Csik, T.I. Verbitska, E.V. Figurhaya, R.A. Shkarban // Functional Materials. — 2013. — Т. 20, № 3. — С. 332-339. — Бібліогр.: 17 назв. — англ.

The influence of Pt on solid state reactions in Ni (30 nm)/Pt(x) /Siep.(50 nm)/ Si (001) (x=2 nm, 6 nm) nanodimensional films has been investigated. The layers of Pt and Ni were produced by magnetron sputtering technique on the epitaxially grown 50 nm Si layer on the top of the monocryst...