Neimash, V., Puzenko, O., Kraitchinskii, A., Krasko, M., Putselyk, S., Claeys, C., & Simoen, E. (2000). Microfluctuations of oxygen impurity concentration as a reason of accelerated oxygen diffusion in silicon. Semiconductor Physics Quantum Electronics & Optoelectronics.
Чикаго стиль цитування (17-те видання)Neimash, V.B, O.O Puzenko, A.M Kraitchinskii, M.M Krasko, S. Putselyk, C. Claeys, та E. Simoen. "Microfluctuations of Oxygen Impurity Concentration as a Reason of Accelerated Oxygen Diffusion in Silicon." Semiconductor Physics Quantum Electronics & Optoelectronics 2000.
Стиль цитування MLA (8-ме видання)Neimash, V.B, et al. "Microfluctuations of Oxygen Impurity Concentration as a Reason of Accelerated Oxygen Diffusion in Silicon." Semiconductor Physics Quantum Electronics & Optoelectronics, 2000.