Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution

Kinetics of oxygen distribution variation and oxygen clusters (thermodonors) formation is considered and described by a system of nonlinear equations. Analytic solution is obtained for homogeneous nonstationary distribution of oxygen and its complexes. It is shown that due to the interaction of oxyg...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2000
Main Author: Selishchev, P.A.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2000
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/120230
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution / P.A. Selishchev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 19-21. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120230
record_format dspace
spelling Selishchev, P.A.
2017-06-11T13:17:47Z
2017-06-11T13:17:47Z
2000
Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution / P.A. Selishchev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 19-21. — Бібліогр.: 10 назв. — англ.
1560-8034
PACS: 36.40. M, 61.66, 61.72. T, 68.65
https://nasplib.isofts.kiev.ua/handle/123456789/120230
Kinetics of oxygen distribution variation and oxygen clusters (thermodonors) formation is considered and described by a system of nonlinear equations. Analytic solution is obtained for homogeneous nonstationary distribution of oxygen and its complexes. It is shown that due to the interaction of oxygen interstitials and their complexes the homogeneous state becomes unstable at some conditions, and spatial periodical distribution develops. Its period lies in the range of 10-1000 Å .
The author are grateful to O.A. Leontev for his contributuions to technical providing the work.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
spellingShingle Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
Selishchev, P.A.
title_short Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
title_full Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
title_fullStr Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
title_full_unstemmed Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
title_sort accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution
author Selishchev, P.A.
author_facet Selishchev, P.A.
publishDate 2000
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Kinetics of oxygen distribution variation and oxygen clusters (thermodonors) formation is considered and described by a system of nonlinear equations. Analytic solution is obtained for homogeneous nonstationary distribution of oxygen and its complexes. It is shown that due to the interaction of oxygen interstitials and their complexes the homogeneous state becomes unstable at some conditions, and spatial periodical distribution develops. Its period lies in the range of 10-1000 Å .
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/120230
citation_txt Accumulation dynamics of oxygen clusters in silicon and formation of their nonhomogeneous distribution / P.A. Selishchev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 19-21. — Бібліогр.: 10 назв. — англ.
work_keys_str_mv AT selishchevpa accumulationdynamicsofoxygenclustersinsiliconandformationoftheirnonhomogeneousdistribution
first_indexed 2025-12-07T20:07:00Z
last_indexed 2025-12-07T20:07:00Z
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