AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers

Mercury cadmium telluride epitaxial layers exhibiting large areas with nearly atomically-flat surface were grown using liquid phase epitaxy (LPE) from Te-rich solution in closed system. Evolution of surface morphology during different steps of LPE growth was studied using scanning probe microscopy....

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2000
Автори: Beketov, G.V., Rashkovetskiy, L.V., Rengevych, O.V., Zhovnir, G.I.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2000
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/120233
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers / G.V. Beketov, L.V. Rashkovetskiy, O.V. Rengevych, G.I. Zhovnir // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 45-51. — Бібліогр.: 16 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120233
record_format dspace
spelling Beketov, G.V.
Rashkovetskiy, L.V.
Rengevych, O.V.
Zhovnir, G.I.
2017-06-11T13:26:43Z
2017-06-11T13:26:43Z
2000
AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers / G.V. Beketov, L.V. Rashkovetskiy, O.V. Rengevych, G.I. Zhovnir // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 45-51. — Бібліогр.: 16 назв. — англ.
1560-8034
PACS 68.65, 81.05. E, 81.15. L
https://nasplib.isofts.kiev.ua/handle/123456789/120233
Mercury cadmium telluride epitaxial layers exhibiting large areas with nearly atomically-flat surface were grown using liquid phase epitaxy (LPE) from Te-rich solution in closed system. Evolution of surface morphology during different steps of LPE growth was studied using scanning probe microscopy. Various growth features including monomolecular steps were observed. Both scanning probe microscopy (SPM) images and surface composition analysis with X-ray fluorescence spectroscopy clearly showed that vapor phase growth at the melt homogenization step contributed to epilayer formation and further evolution of its morphology. It was found that formation of flat areas proceeds via a dislocation-controlled monomolecular step growth mechanism. Phenomenological estimation of local supersaturation conditions giving rise to these areas was given on the basis of the interstep distance of the growth spirals originating from screw dislocations. The results obtained suggest the way of radical morphological improvement of the LPE-grown epilayers.
Authors would like to thank Dr. S. Kavertsev for helpful discussions and suggestions during the course of this work and to Dr. P. Lytvyn for measurements and iterpretation of X-ray fluorescence spectra.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
spellingShingle AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
Beketov, G.V.
Rashkovetskiy, L.V.
Rengevych, O.V.
Zhovnir, G.I.
title_short AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
title_full AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
title_fullStr AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
title_full_unstemmed AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers
title_sort afm study of micromorphology and microscopic growth mechanisms of hg₁₋x cdxte lpe epitaxial layers
author Beketov, G.V.
Rashkovetskiy, L.V.
Rengevych, O.V.
Zhovnir, G.I.
author_facet Beketov, G.V.
Rashkovetskiy, L.V.
Rengevych, O.V.
Zhovnir, G.I.
publishDate 2000
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Mercury cadmium telluride epitaxial layers exhibiting large areas with nearly atomically-flat surface were grown using liquid phase epitaxy (LPE) from Te-rich solution in closed system. Evolution of surface morphology during different steps of LPE growth was studied using scanning probe microscopy. Various growth features including monomolecular steps were observed. Both scanning probe microscopy (SPM) images and surface composition analysis with X-ray fluorescence spectroscopy clearly showed that vapor phase growth at the melt homogenization step contributed to epilayer formation and further evolution of its morphology. It was found that formation of flat areas proceeds via a dislocation-controlled monomolecular step growth mechanism. Phenomenological estimation of local supersaturation conditions giving rise to these areas was given on the basis of the interstep distance of the growth spirals originating from screw dislocations. The results obtained suggest the way of radical morphological improvement of the LPE-grown epilayers.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/120233
citation_txt AFM study of micromorphology and microscopic growth mechanisms of Hg₁₋x CdxTe LPE epitaxial layers / G.V. Beketov, L.V. Rashkovetskiy, O.V. Rengevych, G.I. Zhovnir // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 1. — С. 45-51. — Бібліогр.: 16 назв. — англ.
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AT rengevychov afmstudyofmicromorphologyandmicroscopicgrowthmechanismsofhg1xcdxtelpeepitaxiallayers
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