Evaluation of the efficiency of interband radiative recombination in high quality Si

It is shown theoretically that quantum efficiency of interband radiation in highly purified silicon with low concentration of deep impurities and defects can exceed 10% at room temperatures in the case of negligibly small surface recombination. Dependencies of quantum efficiency on intensity and wav...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:1999
Hauptverfasser: Sachenko, A.V., Kryuchenko, Yu.V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1999
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/120242
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Evaluation of the efficiency of interband radiative recombination in high quality Si / A.V. Sachenko, Yu.V. Kryuchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 4. — С. 55-60. — Бібліогр.: 17 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120242
record_format dspace
spelling Sachenko, A.V.
Kryuchenko, Yu.V.
2017-06-11T13:39:42Z
2017-06-11T13:39:42Z
1999
Evaluation of the efficiency of interband radiative recombination in high quality Si / A.V. Sachenko, Yu.V. Kryuchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 4. — С. 55-60. — Бібліогр.: 17 назв. — англ.
1560-8034
PACS 72.20.J, 78.55, 78.60
https://nasplib.isofts.kiev.ua/handle/123456789/120242
It is shown theoretically that quantum efficiency of interband radiation in highly purified silicon with low concentration of deep impurities and defects can exceed 10% at room temperatures in the case of negligibly small surface recombination. Dependencies of quantum efficiency on intensity and wavelength of exciting monochromatic light, surface recombination rate and thickness of silicon plate are discussed.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Evaluation of the efficiency of interband radiative recombination in high quality Si
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Evaluation of the efficiency of interband radiative recombination in high quality Si
spellingShingle Evaluation of the efficiency of interband radiative recombination in high quality Si
Sachenko, A.V.
Kryuchenko, Yu.V.
title_short Evaluation of the efficiency of interband radiative recombination in high quality Si
title_full Evaluation of the efficiency of interband radiative recombination in high quality Si
title_fullStr Evaluation of the efficiency of interband radiative recombination in high quality Si
title_full_unstemmed Evaluation of the efficiency of interband radiative recombination in high quality Si
title_sort evaluation of the efficiency of interband radiative recombination in high quality si
author Sachenko, A.V.
Kryuchenko, Yu.V.
author_facet Sachenko, A.V.
Kryuchenko, Yu.V.
publishDate 1999
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description It is shown theoretically that quantum efficiency of interband radiation in highly purified silicon with low concentration of deep impurities and defects can exceed 10% at room temperatures in the case of negligibly small surface recombination. Dependencies of quantum efficiency on intensity and wavelength of exciting monochromatic light, surface recombination rate and thickness of silicon plate are discussed.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/120242
citation_txt Evaluation of the efficiency of interband radiative recombination in high quality Si / A.V. Sachenko, Yu.V. Kryuchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 4. — С. 55-60. — Бібліогр.: 17 назв. — англ.
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first_indexed 2025-12-07T20:54:05Z
last_indexed 2025-12-07T20:54:05Z
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