Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film

Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film

Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and w...

Повний опис

Збережено в:
Бібліографічні деталі
Опубліковано в: :Functional Materials
Дата:2016
Автори: Oberemok, O.S., Sabov, T.M., Lisovskyy, I.P., Khacevych, I.M., Gudymenko, O.Yo., Nikirin, V.A., Voitovych, M.V.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2016
Теми:
Technology
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/120639
Теги: Додати тег
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120639
record_format dspace
spelling Oberemok, O.S.
Sabov, T.M.
Lisovskyy, I.P.
Khacevych, I.M.
Gudymenko, O.Yo.
Nikirin, V.A.
Voitovych, M.V.
2017-06-12T14:33:23Z
2017-06-12T14:33:23Z
2016
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ.
1027-5495
DOI: dx.doi.org/10.15407/fm23.02.313
https://nasplib.isofts.kiev.ua/handle/123456789/120639
Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and with the face centered cubic structure for the heated substrate. Surface morphology of films consists of nanocrystalline randomly oriented grains. Increasing of the deposition rate and/or the substrate temperature lead to decrease of the film porosity and enlarge of nanocrystals. The maximum oxidation state of the deposited films is observed near the surface.
en
НТК «Інститут монокристалів» НАН України
Functional Materials
Technology
Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
spellingShingle Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
Oberemok, O.S.
Sabov, T.M.
Lisovskyy, I.P.
Khacevych, I.M.
Gudymenko, O.Yo.
Nikirin, V.A.
Voitovych, M.V.
Technology
title_short Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
title_full Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
title_fullStr Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
title_full_unstemmed Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film
title_sort influence of deposition rate and substrate temperature on structure and optical features of nio thin film
author Oberemok, O.S.
Sabov, T.M.
Lisovskyy, I.P.
Khacevych, I.M.
Gudymenko, O.Yo.
Nikirin, V.A.
Voitovych, M.V.
author_facet Oberemok, O.S.
Sabov, T.M.
Lisovskyy, I.P.
Khacevych, I.M.
Gudymenko, O.Yo.
Nikirin, V.A.
Voitovych, M.V.
topic Technology
topic_facet Technology
publishDate 2016
language English
container_title Functional Materials
publisher НТК «Інститут монокристалів» НАН України
format Article
description Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and with the face centered cubic structure for the heated substrate. Surface morphology of films consists of nanocrystalline randomly oriented grains. Increasing of the deposition rate and/or the substrate temperature lead to decrease of the film porosity and enlarge of nanocrystals. The maximum oxidation state of the deposited films is observed near the surface.
issn 1027-5495
url https://nasplib.isofts.kiev.ua/handle/123456789/120639
citation_txt Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ.
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AT nikirinva influenceofdepositionrateandsubstratetemperatureonstructureandopticalfeaturesofniothinfilm
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first_indexed 2025-12-07T18:58:37Z
last_indexed 2025-12-07T18:58:37Z
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