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Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film

Nickel oxide thin films were prepared by direct-current magnetron sputtering method at different deposition rates on unheated and heated substrates. It was shown that the deposited films are the dense arrays of nanowhiskers with the rhombohedral crystalline structure for the unheated substrate and w...

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Veröffentlicht in:Functional Materials
Datum:2016
Hauptverfasser: Oberemok, O.S., Sabov, T.M., Lisovskyy, I.P., Khacevych, I.M., Gudymenko, O.Yo., Nikirin, V.A., Voitovych, M.V.
Format: Artikel
Sprache:Englisch
Veröffentlicht: НТК «Інститут монокристалів» НАН України 2016
Schlagworte:
Technology
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/120639
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film / O.S. Oberemok, T.M. Sabov, I.P. Lisovskyy, I.M. Khacevych, O.Yo. Gudymenko, V.A. Nikirin, M.V. Voitovych // Functional Materials. — 2016. — Т. 23, № 2. — С. 313-317. — Бібліогр.: 8 назв. — англ.

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