Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon

Low-frequency internal friction and dynamic shear modulus (Geff) in Si monocrystal were investigated in the range of 20 to 200 ºC. Temperature hysteresis of internal friction was found and effective shear modulus was studied in the unirradiated and a series of irradiated silicon samples. The appeara...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2005
Hauptverfasser: Gutsulyak, B.I., Oliynych-Lysyuk, A.V., Fodchuk, I.M.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/120967
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon / B.I. Gutsulyak, A.V. Oliynych-Lysyuk, I.M. Fodchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 25-29. — Бібліогр.: 19 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120967
record_format dspace
spelling Gutsulyak, B.I.
Oliynych-Lysyuk, A.V.
Fodchuk, I.M.
2017-06-13T11:21:38Z
2017-06-13T11:21:38Z
2005
Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon / B.I. Gutsulyak, A.V. Oliynych-Lysyuk, I.M. Fodchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 25-29. — Бібліогр.: 19 назв. — англ.
1560-8034
PACS: 62.20.Dc, 81.40.Jj
https://nasplib.isofts.kiev.ua/handle/123456789/120967
Low-frequency internal friction and dynamic shear modulus (Geff) in Si monocrystal were investigated in the range of 20 to 200 ºC. Temperature hysteresis of internal friction was found and effective shear modulus was studied in the unirradiated and a series of irradiated silicon samples. The appearance of a hysteresis loop is due to interaction of genetic microdefects with crystal point defects and their nonsymmetric distribution in the process of samples heating-cooling.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
spellingShingle Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
Gutsulyak, B.I.
Oliynych-Lysyuk, A.V.
Fodchuk, I.M.
title_short Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
title_full Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
title_fullStr Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
title_full_unstemmed Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
title_sort character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon
author Gutsulyak, B.I.
Oliynych-Lysyuk, A.V.
Fodchuk, I.M.
author_facet Gutsulyak, B.I.
Oliynych-Lysyuk, A.V.
Fodchuk, I.M.
publishDate 2005
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Low-frequency internal friction and dynamic shear modulus (Geff) in Si monocrystal were investigated in the range of 20 to 200 ºC. Temperature hysteresis of internal friction was found and effective shear modulus was studied in the unirradiated and a series of irradiated silicon samples. The appearance of a hysteresis loop is due to interaction of genetic microdefects with crystal point defects and their nonsymmetric distribution in the process of samples heating-cooling.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/120967
citation_txt Character of elastic energy absorption in well developed genetic-impurity defect structure in monocrystalline silicon / B.I. Gutsulyak, A.V. Oliynych-Lysyuk, I.M. Fodchuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 25-29. — Бібліогр.: 19 назв. — англ.
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AT fodchukim characterofelasticenergyabsorptioninwelldevelopedgeneticimpuritydefectstructureinmonocrystallinesilicon
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