Physico-Chemical model and computer simulations of silicon nanowire growth

A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature...

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Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2005
Автори: Efremov, A., Klimovskaya, A., Kamins, T., Shanina, B., Grygoryev, K ., Lukyanets, S .
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/120978
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-120978
record_format dspace
spelling Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
2017-06-13T11:50:09Z
2017-06-13T11:50:09Z
2005
Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ.
1560-8034
PACS: 68.70.+w, 81.10.-h, 81.15.Aa, 64.60.Qb
https://nasplib.isofts.kiev.ua/handle/123456789/120978
A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature, bulk diffusion of silicon adatoms through catalyst – body, and 2D nucleation. The simulation of atomic transport across surfaces is based on a long-wave approach of lattice gas approximation. To determine a character of atomic transport in TiSi₂-catalyst that is of great importance for application in Si-based technology, a density functional theory is used. The main result of modeling is that it is found a relationship between growth conditions (an initial radius of catalyst particles, their density, substrate temperature, content, pressure of gas, as well as properties of materials used) and, on the other hand, a growth rate, shape, composition, and type of atomic structure (amorphous or crystalline) of the nanowires grown. Besides, available experimental data published previously are discussed, and a qualitative agreement between theory and various experiments is obtained. This agreement gives rise to use the found relationship for controlling the nanowire growth.
This work was performed in the framework of CRDF Project # UE-5001-KV-03. The authors wish to express their sincere gratitude to Prof. P.M. Tomchuk (Institute of Physics, National Academy of Sciences of Ukraine) for helpful discussions. The authors also thank Dr. S. Sharma and Dr. R. Stanley Williams of Hewlett-Packard for providing experimental data and for useful Discussions.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Physico-Chemical model and computer simulations of silicon nanowire growth
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Physico-Chemical model and computer simulations of silicon nanowire growth
spellingShingle Physico-Chemical model and computer simulations of silicon nanowire growth
Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
title_short Physico-Chemical model and computer simulations of silicon nanowire growth
title_full Physico-Chemical model and computer simulations of silicon nanowire growth
title_fullStr Physico-Chemical model and computer simulations of silicon nanowire growth
title_full_unstemmed Physico-Chemical model and computer simulations of silicon nanowire growth
title_sort physico-chemical model and computer simulations of silicon nanowire growth
author Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
author_facet Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
publishDate 2005
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature, bulk diffusion of silicon adatoms through catalyst – body, and 2D nucleation. The simulation of atomic transport across surfaces is based on a long-wave approach of lattice gas approximation. To determine a character of atomic transport in TiSi₂-catalyst that is of great importance for application in Si-based technology, a density functional theory is used. The main result of modeling is that it is found a relationship between growth conditions (an initial radius of catalyst particles, their density, substrate temperature, content, pressure of gas, as well as properties of materials used) and, on the other hand, a growth rate, shape, composition, and type of atomic structure (amorphous or crystalline) of the nanowires grown. Besides, available experimental data published previously are discussed, and a qualitative agreement between theory and various experiments is obtained. This agreement gives rise to use the found relationship for controlling the nanowire growth.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/120978
citation_txt Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ.
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first_indexed 2025-12-07T19:45:03Z
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