Borophosphosilicate glass component analysis using secondary neutral mass spectrometry
In the present study the SNMS technique for the quantitative component analysis of the borophosphosilicate glass layers was used. These layers were deposited on the silicon substrate by chemical vapor deposition method. The charge-up of the surface is compensated by plasma gas electrons in the high...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Datum: | 2002 |
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | English |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2002
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/121124 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Borophosphosilicate glass component analysis using secondary neutral mass spectrometry / O. Oberemok, P. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 101-105. — Бібліогр.: 11 назв. — англ. |
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Oberemok, O. Lytvyn, P. 2017-06-13T15:21:50Z 2017-06-13T15:21:50Z 2002 Borophosphosilicate glass component analysis using secondary neutral mass spectrometry / O. Oberemok, P. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 101-105. — Бібліогр.: 11 назв. — англ. 1560-8034 PACS: 68.49.S, 82.80.M, 61.72.T, V, W, 73.20.H, 68.37.P, 61.43.F https://nasplib.isofts.kiev.ua/handle/123456789/121124 In the present study the SNMS technique for the quantitative component analysis of the borophosphosilicate glass layers was used. These layers were deposited on the silicon substrate by chemical vapor deposition method. The charge-up of the surface is compensated by plasma gas electrons in the high frequency mode sputtering. It is shown that modes of such sputtering significantly influence on the macro- and microrelief of the crater during the process of the depth component distribution analysis. An on-off time ratio change of the voltage applied to the sample results in changing the crater shape. At the same time the increase of the sputtering frequency results in appearance of thin protrusions at the crater bottom. Improvement of the depth resolution requires optimization both on-off time ratio and frequency of voltage applied to the sample. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Borophosphosilicate glass component analysis using secondary neutral mass spectrometry Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| spellingShingle |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry Oberemok, O. Lytvyn, P. |
| title_short |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| title_full |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| title_fullStr |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| title_full_unstemmed |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| title_sort |
borophosphosilicate glass component analysis using secondary neutral mass spectrometry |
| author |
Oberemok, O. Lytvyn, P. |
| author_facet |
Oberemok, O. Lytvyn, P. |
| publishDate |
2002 |
| language |
English |
| container_title |
Semiconductor Physics Quantum Electronics & Optoelectronics |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| format |
Article |
| description |
In the present study the SNMS technique for the quantitative component analysis of the borophosphosilicate glass layers was used. These layers were deposited on the silicon substrate by chemical vapor deposition method. The charge-up of the surface is compensated by plasma gas electrons in the high frequency mode sputtering. It is shown that modes of such sputtering significantly influence on the macro- and microrelief of the crater during the process of the depth component distribution analysis. An on-off time ratio change of the voltage applied to the sample results in changing the crater shape. At the same time the increase of the sputtering frequency results in appearance of thin protrusions at the crater bottom. Improvement of the depth resolution requires optimization both on-off time ratio and frequency of voltage applied to the sample.
|
| issn |
1560-8034 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/121124 |
| citation_txt |
Borophosphosilicate glass component analysis using secondary neutral mass spectrometry / O. Oberemok, P. Lytvyn // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 1. — С. 101-105. — Бібліогр.: 11 назв. — англ. |
| work_keys_str_mv |
AT oberemoko borophosphosilicateglasscomponentanalysisusingsecondaryneutralmassspectrometry AT lytvynp borophosphosilicateglasscomponentanalysisusingsecondaryneutralmassspectrometry |
| first_indexed |
2025-12-07T19:39:29Z |
| last_indexed |
2025-12-07T19:39:29Z |
| _version_ |
1850879633886543872 |