Surface polariton excitation in ZnO films deposited using ALD
The conductive ZnO films deposited using atomic layer deposition (ALD) on the optical glass substrates were studied using the modified method of the disturbed total internal reflection within the range 400…1400 cm⁻¹ for the first time. The frequency “windows” with the obtained excited surface phonon...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Datum: | 2015 |
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| Format: | Artikel |
| Sprache: | Englisch |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2015
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/121268 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Surface polariton excitation in ZnO films deposited using ALD / E.F. Venger, L.Yu. Melnichuk, A.V. Melnichuk, T.V. Semikina // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 422-427. — Бібліогр.: 15 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862719453625581568 |
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| author | Venger, E.F. Melnichuk, L.Yu. Melnichuk, A.V. Semikina, T.V. |
| author_facet | Venger, E.F. Melnichuk, L.Yu. Melnichuk, A.V. Semikina, T.V. |
| citation_txt | Surface polariton excitation in ZnO films deposited using ALD / E.F. Venger, L.Yu. Melnichuk, A.V. Melnichuk, T.V. Semikina // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 422-427. — Бібліогр.: 15 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The conductive ZnO films deposited using atomic layer deposition (ALD) on the optical glass substrates were studied using the modified method of the disturbed total internal reflection within the range 400…1400 cm⁻¹ for the first time. The frequency “windows” with the obtained excited surface phonon and plasmon-phonon polaritons have been found in the measured infrared reflectance spectra. The dispersion response of high and low frequency branches of the IR spectra have been presented.
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| first_indexed | 2025-12-07T18:20:09Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-121268 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-12-07T18:20:09Z |
| publishDate | 2015 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Venger, E.F. Melnichuk, L.Yu. Melnichuk, A.V. Semikina, T.V. 2017-06-13T18:28:05Z 2017-06-13T18:28:05Z 2015 Surface polariton excitation in ZnO films deposited using ALD / E.F. Venger, L.Yu. Melnichuk, A.V. Melnichuk, T.V. Semikina // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 422-427. — Бібліогр.: 15 назв. — англ. 1560-8034 DOI: 10.15407/spqeo18.04.422 PACS 71.36.+c, 73.20.20.Mf https://nasplib.isofts.kiev.ua/handle/123456789/121268 The conductive ZnO films deposited using atomic layer deposition (ALD) on the optical glass substrates were studied using the modified method of the disturbed total internal reflection within the range 400…1400 cm⁻¹ for the first time. The frequency “windows” with the obtained excited surface phonon and plasmon-phonon polaritons have been found in the measured infrared reflectance spectra. The dispersion response of high and low frequency branches of the IR spectra have been presented. Author Semikina T.V. expresses gratitude to Prof. M.Godlewski (Warsaw, Poland) for possibility of providing this experimental work and deposition of ZnO films by using the ALD equipment Savannah-100 en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Surface polariton excitation in ZnO films deposited using ALD Article published earlier |
| spellingShingle | Surface polariton excitation in ZnO films deposited using ALD Venger, E.F. Melnichuk, L.Yu. Melnichuk, A.V. Semikina, T.V. |
| title | Surface polariton excitation in ZnO films deposited using ALD |
| title_full | Surface polariton excitation in ZnO films deposited using ALD |
| title_fullStr | Surface polariton excitation in ZnO films deposited using ALD |
| title_full_unstemmed | Surface polariton excitation in ZnO films deposited using ALD |
| title_short | Surface polariton excitation in ZnO films deposited using ALD |
| title_sort | surface polariton excitation in zno films deposited using ald |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/121268 |
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