Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist

This study reports on development of the interference lithography (IL) technique applying the resist based on chalcogenide glass films for fabrication of gold chips in the nform of periodic surface nanostructures for surface plasmon resonance (SPR) refractometers. The IL technique was optimized for...

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Бібліографічні деталі
Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2015
Автори: Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/121271
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist / V.A. Dan’ko, G.V. Dorozinsky, I.Z. Indutnyi, V.I. Myn’ko, Yu.V. Ushenin, P.E. Shepeliavyi, M.V. Lukaniuk, A.A. Korchovyi, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 438-442. — Бібліогр.: 15 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Dan’ko, V.A.
Dorozinsky, G.V.
Indutnyi, I.Z.
Myn’ko, V.I.
Ushenin, Yu.V.
Shepeliavyi, P.E.
Lukaniuk, M.V.
Korchovyi, A.A.
Khrystosenko, R.V.
author_facet Dan’ko, V.A.
Dorozinsky, G.V.
Indutnyi, I.Z.
Myn’ko, V.I.
Ushenin, Yu.V.
Shepeliavyi, P.E.
Lukaniuk, M.V.
Korchovyi, A.A.
Khrystosenko, R.V.
citation_txt Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist / V.A. Dan’ko, G.V. Dorozinsky, I.Z. Indutnyi, V.I. Myn’ko, Yu.V. Ushenin, P.E. Shepeliavyi, M.V. Lukaniuk, A.A. Korchovyi, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 438-442. — Бібліогр.: 15 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description This study reports on development of the interference lithography (IL) technique applying the resist based on chalcogenide glass films for fabrication of gold chips in the nform of periodic surface nanostructures for surface plasmon resonance (SPR) refractometers. The IL technique was optimized for patterning the Au layers and formation of one-dimensional (grating) structures with the spatial frequency close to 3300 mm⁻¹. The spatial frequency and depth of grating grooves were selected with account of the condition for Bragg reflection of plasmons at the operation wavelength of SPR refractometer and given environment (which is a condition for enhancing biosensor sensitivity as compared to that of a flat Au chip surface). It has experimentally been demonstrated that the use of diffraction patterns in SPR sensor increases its response by 17%.
first_indexed 2025-11-30T10:07:56Z
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language English
last_indexed 2025-11-30T10:07:56Z
publishDate 2015
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
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spelling Dan’ko, V.A.
Dorozinsky, G.V.
Indutnyi, I.Z.
Myn’ko, V.I.
Ushenin, Yu.V.
Shepeliavyi, P.E.
Lukaniuk, M.V.
Korchovyi, A.A.
Khrystosenko, R.V.
2017-06-13T18:57:57Z
2017-06-13T18:57:57Z
2015
Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist / V.A. Dan’ko, G.V. Dorozinsky, I.Z. Indutnyi, V.I. Myn’ko, Yu.V. Ushenin, P.E. Shepeliavyi, M.V. Lukaniuk, A.A. Korchovyi, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 438-442. — Бібліогр.: 15 назв. — англ.
1560-8034
DOI: 10.15407/spqeo18.04.438
PACS 73.20.Mf, 78.67.-n, 81.16.nd, 85.40.Hp
https://nasplib.isofts.kiev.ua/handle/123456789/121271
This study reports on development of the interference lithography (IL) technique applying the resist based on chalcogenide glass films for fabrication of gold chips in the nform of periodic surface nanostructures for surface plasmon resonance (SPR) refractometers. The IL technique was optimized for patterning the Au layers and formation of one-dimensional (grating) structures with the spatial frequency close to 3300 mm⁻¹. The spatial frequency and depth of grating grooves were selected with account of the condition for Bragg reflection of plasmons at the operation wavelength of SPR refractometer and given environment (which is a condition for enhancing biosensor sensitivity as compared to that of a flat Au chip surface). It has experimentally been demonstrated that the use of diffraction patterns in SPR sensor increases its response by 17%.
The authors gratefully acknowledge that this work have been partly funded by the Swiss National Science Foundation (SNSF, Bern) under grant no. IZ73Z0_152661 (SCOPES).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
Article
published earlier
spellingShingle Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
Dan’ko, V.A.
Dorozinsky, G.V.
Indutnyi, I.Z.
Myn’ko, V.I.
Ushenin, Yu.V.
Shepeliavyi, P.E.
Lukaniuk, M.V.
Korchovyi, A.A.
Khrystosenko, R.V.
title Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
title_full Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
title_fullStr Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
title_full_unstemmed Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
title_short Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist
title_sort nanopatterning au chips for spr refractometer by using interference lithography and chalcogenide photoresist
url https://nasplib.isofts.kiev.ua/handle/123456789/121271
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