Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2015
• Hauptverfasser: Dan’ko, V.A., Dorozinsky, G.V., Indutnyi, I.Z., Myn’ko, V.I., Ushenin, Yu.V., Shepeliavyi, P.E., Lukaniuk, M.V., Korchovyi, A.A., Khrystosenko, R.V.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/121271
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Nanopatterning Au chips for SPR refractometer by using interference lithography and chalcogenide photoresist / V.A. Dan’ko, G.V. Dorozinsky, I.Z. Indutnyi, V.I. Myn’ko, Yu.V. Ushenin, P.E. Shepeliavyi, M.V. Lukaniuk, A.A. Korchovyi, R.V. Khrystosenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 438-442. — Бібліогр.: 15 назв. — англ.

This study reports on development of the interference lithography (IL) technique applying the resist based on chalcogenide glass films for fabrication of gold chips in the nform of periodic surface nanostructures for surface plasmon resonance (SPR) refractometers. The IL technique was optimized for...