Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film

We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that i...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2015
Автор: Okhrimenko, O.B
Формат: Стаття
Мова:Англійська
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2015
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/121274
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Okhrimenko, O.B
author_facet Okhrimenko, O.B
citation_txt Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that is a combination of several processes that are described by various models. Interaction of processes caused by the resonant interaction of microwave radiation with the intrinsic oscillations of dislocations, which can lead to dislocation motion, has been considered. The length of dislocations, for which the condition of the resonant interaction is fulfilled, has been estimated. It has been shown that the combination of the considered processes can lead to appearance of additional centers of light absorption or scattering, which is manifested in the spectra of optical absorption and photoluminescence of the structures wide-gap semiconductor – oxide film
first_indexed 2025-12-07T17:15:10Z
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language English
last_indexed 2025-12-07T17:15:10Z
publishDate 2015
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Okhrimenko, O.B
2017-06-13T18:59:27Z
2017-06-13T18:59:27Z
2015
Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film / O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2015. — Т. 18, № 4. — С. 452-455. — Бібліогр.: 13 назв. — англ.
1560-8034
DOI: 10.15407/spqeo18.04.452
PACS 61.72.Ff, 68.35.-p, 78.70.Gq
https://nasplib.isofts.kiev.ua/handle/123456789/121274
We propose a phenomenological model that explains the changes in the optical spectra of the structures wide gap semiconductor – oxide film, which takes place as a result of short-term microwave treatment. To explain the specific athermal microwave exposure, proposed was an integrated approach that is a combination of several processes that are described by various models. Interaction of processes caused by the resonant interaction of microwave radiation with the intrinsic oscillations of dislocations, which can lead to dislocation motion, has been considered. The length of dislocations, for which the condition of the resonant interaction is fulfilled, has been estimated. It has been shown that the combination of the considered processes can lead to appearance of additional centers of light absorption or scattering, which is manifested in the spectra of optical absorption and photoluminescence of the structures wide-gap semiconductor – oxide film
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
Article
published earlier
spellingShingle Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
Okhrimenko, O.B
title Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_full Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_fullStr Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_full_unstemmed Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_short Phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
title_sort phenomenological model of athermal interaction of microwave radiation with the structures wide-gap semiconductor – oxide film
url https://nasplib.isofts.kiev.ua/handle/123456789/121274
work_keys_str_mv AT okhrimenkoob phenomenologicalmodelofathermalinteractionofmicrowaveradiationwiththestructureswidegapsemiconductoroxidefilm