Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing

Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing

Using X-ray phase analysis, Auger electron spectroscopy and atomic force microscopy, we investigated structural-phase transformations in the Ni/n-21R-SiC system induced by rapid thermal annealing in a vacuum (pressure of 10-² Pa) in the 450-1100 °С temperature range. It was found that modification o...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2002
Hauptverfasser: Litvinov, V.L., Demakov, K.D., Agueev, O.A., Svetlichny, A.M., Konakova, R.V., Lytvyn, P.M., Lytvyn, O.S., Milenin, V.V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2002
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121364
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing / V.L. Litvinov, K.D. Demakov, O.A. Agueev, A.M. Svetlichny, R.V. Konakova, P.M. Lytvyn, O.S. Lytvyn, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 4. — С. 457-464. — Бібліогр.: 12 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121364
record_format dspace
spelling Litvinov, V.L.
Demakov, K.D.
Agueev, O.A.
Svetlichny, A.M.
Konakova, R.V.
Lytvyn, P.M.
Lytvyn, O.S.
Milenin, V.V.
2017-06-14T07:53:30Z
2017-06-14T07:53:30Z
2002
Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing / V.L. Litvinov, K.D. Demakov, O.A. Agueev, A.M. Svetlichny, R.V. Konakova, P.M. Lytvyn, O.S. Lytvyn, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 4. — С. 457-464. — Бібліогр.: 12 назв. — англ.
1560-8034
PACS: 73.40.Ns, 73.30.+y
https://nasplib.isofts.kiev.ua/handle/123456789/121364
Using X-ray phase analysis, Auger electron spectroscopy and atomic force microscopy, we investigated structural-phase transformations in the Ni/n-21R-SiC system induced by rapid thermal annealing in a vacuum (pressure of 10-² Pa) in the 450-1100 °С temperature range. It was found that modification of contact I-V curves from barrier-type to ohmic is due to appearance of local contact areas with different barrier heights (among them areas with ohmic conduction). Generation of the above nonuniformities results from intense heterodiffusion of the system components, as well as formation and recrystallization of various nickel silicide phases (differing in stoichiometry) and degradation of planar uniformity of both interface and Ni film.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
spellingShingle Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
Litvinov, V.L.
Demakov, K.D.
Agueev, O.A.
Svetlichny, A.M.
Konakova, R.V.
Lytvyn, P.M.
Lytvyn, O.S.
Milenin, V.V.
title_short Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
title_full Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
title_fullStr Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
title_full_unstemmed Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing
title_sort evolution of structural and electrophysical parameters of ni/sic contacts at rapid thermal annealing
author Litvinov, V.L.
Demakov, K.D.
Agueev, O.A.
Svetlichny, A.M.
Konakova, R.V.
Lytvyn, P.M.
Lytvyn, O.S.
Milenin, V.V.
author_facet Litvinov, V.L.
Demakov, K.D.
Agueev, O.A.
Svetlichny, A.M.
Konakova, R.V.
Lytvyn, P.M.
Lytvyn, O.S.
Milenin, V.V.
publishDate 2002
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Using X-ray phase analysis, Auger electron spectroscopy and atomic force microscopy, we investigated structural-phase transformations in the Ni/n-21R-SiC system induced by rapid thermal annealing in a vacuum (pressure of 10-² Pa) in the 450-1100 °С temperature range. It was found that modification of contact I-V curves from barrier-type to ohmic is due to appearance of local contact areas with different barrier heights (among them areas with ohmic conduction). Generation of the above nonuniformities results from intense heterodiffusion of the system components, as well as formation and recrystallization of various nickel silicide phases (differing in stoichiometry) and degradation of planar uniformity of both interface and Ni film.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121364
citation_txt Evolution of structural and electrophysical parameters of Ni/SiC contacts at rapid thermal annealing / V.L. Litvinov, K.D. Demakov, O.A. Agueev, A.M. Svetlichny, R.V. Konakova, P.M. Lytvyn, O.S. Lytvyn, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2002. — Т. 5, № 4. — С. 457-464. — Бібліогр.: 12 назв. — англ.
work_keys_str_mv AT litvinovvl evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT demakovkd evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT agueevoa evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT svetlichnyam evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT konakovarv evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT lytvynpm evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT lytvynos evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
AT mileninvv evolutionofstructuralandelectrophysicalparametersofnisiccontactsatrapidthermalannealing
first_indexed 2025-12-07T19:53:45Z
last_indexed 2025-12-07T19:53:45Z
_version_ 1850880531517931520

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