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Stamp stress analysis with low temperature nanoimprint lithography

High temperature nanoimprint lithography has the drawback of long process cycle, demoulding difficulty, polymer degradation, thermal stress. Low temperature nanoimprint lithography (LTNIL) can avoid these problems. LTNIL is also ideal for manufacturing biological compatibility samples since the samp...

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Bibliographic Details
Published in:	Functional Materials
Date:	2016
ISSN:	1027-5495
Main Authors:	Hongwen Sun, Xiaochao Ma, Chenhui Hu
Format:	Article
Language:	English
Published:	НТК «Інститут монокристалів» НАН України 2016
Subjects:	Technology
Online Access:	https://nasplib.isofts.kiev.ua/handle/123456789/121489
Tags:	Add Tag No Tags, Be the first to tag this record!
Journal Title:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:	Stamp stress analysis with low temperature nanoimprint lithography / Hongwen Sun, Xiaochao Ma, Chenhui Hu // Functional Materials. — 2016. — Т. 23, № 3. — С. 517-520. — Бібліогр.: 11 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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