Speckle pattern formation in spatially limited optical systems

The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the op...

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Datum:2016
Hauptverfasser: Kotov, M.M., Kurashov, V.N., Goloborodko, A.A.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Schriftenreihe:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121530
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Speckle pattern formation in spatially limited optical systems / M.M. Kotov, V.N. Kurashov, A.A. Goloborodko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 47-51. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Zusammenfassung:The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the optical system causes significant changes of transferred field.