Electron states at the Si–SiO₂ boundary (Review)

This review is aimed at analysis of the system of discrete and continuously distributed boundary electron states (BES) on (111) and (100) silicon surfaces in the Si-SiO₂ structures prepared mainly using thermal oxidation of silicon. Used here are literature data as well as results obtained by author...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2005
Hauptverfasser: Primachenko, V.E., Kirillova, S.I., Venger, E.F., Chernobai, V.A.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121546
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Electron states at the Si–SiO₂ boundary (Review) / V.E. Primachenko, S.I. Kirillova, V.A. Chernobai, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 38-54. — Бібліогр.: 95 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121546
record_format dspace
spelling Primachenko, V.E.
Kirillova, S.I.
Venger, E.F.
Chernobai, V.A.
2017-06-14T16:13:52Z
2017-06-14T16:13:52Z
2005
Electron states at the Si–SiO₂ boundary (Review) / V.E. Primachenko, S.I. Kirillova, V.A. Chernobai, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 38-54. — Бібліогр.: 95 назв. — англ.
1560-8034
PACS 68.35.-p, 73.20.-r
https://nasplib.isofts.kiev.ua/handle/123456789/121546
This review is aimed at analysis of the system of discrete and continuously distributed boundary electron states (BES) on (111) and (100) silicon surfaces in the Si-SiO₂ structures prepared mainly using thermal oxidation of silicon. Used here are literature data as well as results obtained by authors when studying the temperature and electric field dependencies of the capacitive photovoltage. It has been ascertained that the BES system consists of a continuous U-like distribution in the silicon forbidden gap and from the discrete BES as well. There developed are two discrete BES in the thermally oxidized Si(111)-SiO₂ structure, while in the Si(100)-SiO₂ structure – four ones. These results well coordinated with ESR investigations were obtained using the method of temperature dependencies for capacitive photovoltage without application of an external electric field. As shown, application of various electric-field methods enables to determine only effective parameters of discrete and especially continuously distributed BES, which depend on the temperature of measurements, silicon resistivity and conditions of preparation of the Si-SiO₂ boundary. Considered are the features of pre-oxidation treatment of the silicon surface and its oxidation, the character of the intermediate layer between Si and SiO₂, and the influence of such external factors as annealing in various ambient atmospheres, irradiation and high electric fields as well.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Electron states at the Si–SiO₂ boundary (Review)
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Electron states at the Si–SiO₂ boundary (Review)
spellingShingle Electron states at the Si–SiO₂ boundary (Review)
Primachenko, V.E.
Kirillova, S.I.
Venger, E.F.
Chernobai, V.A.
title_short Electron states at the Si–SiO₂ boundary (Review)
title_full Electron states at the Si–SiO₂ boundary (Review)
title_fullStr Electron states at the Si–SiO₂ boundary (Review)
title_full_unstemmed Electron states at the Si–SiO₂ boundary (Review)
title_sort electron states at the si–sio₂ boundary (review)
author Primachenko, V.E.
Kirillova, S.I.
Venger, E.F.
Chernobai, V.A.
author_facet Primachenko, V.E.
Kirillova, S.I.
Venger, E.F.
Chernobai, V.A.
publishDate 2005
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description This review is aimed at analysis of the system of discrete and continuously distributed boundary electron states (BES) on (111) and (100) silicon surfaces in the Si-SiO₂ structures prepared mainly using thermal oxidation of silicon. Used here are literature data as well as results obtained by authors when studying the temperature and electric field dependencies of the capacitive photovoltage. It has been ascertained that the BES system consists of a continuous U-like distribution in the silicon forbidden gap and from the discrete BES as well. There developed are two discrete BES in the thermally oxidized Si(111)-SiO₂ structure, while in the Si(100)-SiO₂ structure – four ones. These results well coordinated with ESR investigations were obtained using the method of temperature dependencies for capacitive photovoltage without application of an external electric field. As shown, application of various electric-field methods enables to determine only effective parameters of discrete and especially continuously distributed BES, which depend on the temperature of measurements, silicon resistivity and conditions of preparation of the Si-SiO₂ boundary. Considered are the features of pre-oxidation treatment of the silicon surface and its oxidation, the character of the intermediate layer between Si and SiO₂, and the influence of such external factors as annealing in various ambient atmospheres, irradiation and high electric fields as well.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121546
citation_txt Electron states at the Si–SiO₂ boundary (Review) / V.E. Primachenko, S.I. Kirillova, V.A. Chernobai, E.F. Venger // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 38-54. — Бібліогр.: 95 назв. — англ.
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AT kirillovasi electronstatesatthesisio2boundaryreview
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first_indexed 2025-11-30T09:31:06Z
last_indexed 2025-11-30T09:31:06Z
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