New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis

A novel technological approach to fabrication of n-InP autoepitaxial films LPE-grown on porous n⁺-InP substrates, as well as ohmic and barrier contacts to them using (quasi)amorphous TiBx interstitial phases, is proposed. We demonstrate the advantages of TiBx−n-n⁺-n⁺⁺-InP Schottky-barrier diodes mad...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2005
Hauptverfasser: Arsentyev, I.N., Bobyl, A.V., Tarasov, I.S., Shishkov, M.V., Boltovets, N.S., Ivanov, V.N., Kamalov, A.B., Konakova, R.V., Kudryk, Ya.Ya., Lytvyn, O.S., Lytvyn, P.M., Markovskiy, E.P., Milenin, V.V.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121574
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Zitieren:New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis / I.N. Arsentyev, A.V. Bobyl, I.S. Tarasov, M.V. Shishkov, N.S. Boltovets, V.N. Ivanov, A.E. Belyaev, A.B. Kamalov, R.V. Konakova, Ya.Ya. Kudryk, O.S. Lytvyn, P.M. Lytvyn, E.P. Markovskiy, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 105-114. — Бібліогр.: 29 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121574
record_format dspace
spelling Arsentyev, I.N.
Bobyl, A.V.
Tarasov, I.S.
Shishkov, M.V.
Boltovets, N.S.
Ivanov, V.N.
Kamalov, A.B.
Konakova, R.V.
Kudryk, Ya.Ya.
Lytvyn, O.S.
Lytvyn, P.M.
Markovskiy, E.P.
Milenin, V.V.
2017-06-14T16:57:19Z
2017-06-14T16:57:19Z
2005
New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis / I.N. Arsentyev, A.V. Bobyl, I.S. Tarasov, M.V. Shishkov, N.S. Boltovets, V.N. Ivanov, A.E. Belyaev, A.B. Kamalov, R.V. Konakova, Ya.Ya. Kudryk, O.S. Lytvyn, P.M. Lytvyn, E.P. Markovskiy, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 105-114. — Бібліогр.: 29 назв. — англ.
1560-8034
PACS 81.05.Rm
https://nasplib.isofts.kiev.ua/handle/123456789/121574
A novel technological approach to fabrication of n-InP autoepitaxial films LPE-grown on porous n⁺-InP substrates, as well as ohmic and barrier contacts to them using (quasi)amorphous TiBx interstitial phases, is proposed. We demonstrate the advantages of TiBx−n-n⁺-n⁺⁺-InP Schottky-barrier diodes made on porous substrates over those made on the standard rigid substrates, as well as the possibility to make Gunn diodes (intended for the 120−150 GHz frequency range) on the InP epitaxial structures grown on porous substrates.
The work was made in the framework of the Russia−Ukraine Program on Nanophysics and Nanoelectronics.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
spellingShingle New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
Arsentyev, I.N.
Bobyl, A.V.
Tarasov, I.S.
Shishkov, M.V.
Boltovets, N.S.
Ivanov, V.N.
Kamalov, A.B.
Konakova, R.V.
Kudryk, Ya.Ya.
Lytvyn, O.S.
Lytvyn, P.M.
Markovskiy, E.P.
Milenin, V.V.
title_short New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
title_full New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
title_fullStr New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
title_full_unstemmed New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
title_sort new technological possibilities to prepare inp epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis
author Arsentyev, I.N.
Bobyl, A.V.
Tarasov, I.S.
Shishkov, M.V.
Boltovets, N.S.
Ivanov, V.N.
Kamalov, A.B.
Konakova, R.V.
Kudryk, Ya.Ya.
Lytvyn, O.S.
Lytvyn, P.M.
Markovskiy, E.P.
Milenin, V.V.
author_facet Arsentyev, I.N.
Bobyl, A.V.
Tarasov, I.S.
Shishkov, M.V.
Boltovets, N.S.
Ivanov, V.N.
Kamalov, A.B.
Konakova, R.V.
Kudryk, Ya.Ya.
Lytvyn, O.S.
Lytvyn, P.M.
Markovskiy, E.P.
Milenin, V.V.
publishDate 2005
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description A novel technological approach to fabrication of n-InP autoepitaxial films LPE-grown on porous n⁺-InP substrates, as well as ohmic and barrier contacts to them using (quasi)amorphous TiBx interstitial phases, is proposed. We demonstrate the advantages of TiBx−n-n⁺-n⁺⁺-InP Schottky-barrier diodes made on porous substrates over those made on the standard rigid substrates, as well as the possibility to make Gunn diodes (intended for the 120−150 GHz frequency range) on the InP epitaxial structures grown on porous substrates.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121574
citation_txt New technological possibilities to prepare InP epitaxial layers, as well as ohmic and barrier contacts to them, and the properties of microwave diodes made on their basis / I.N. Arsentyev, A.V. Bobyl, I.S. Tarasov, M.V. Shishkov, N.S. Boltovets, V.N. Ivanov, A.E. Belyaev, A.B. Kamalov, R.V. Konakova, Ya.Ya. Kudryk, O.S. Lytvyn, P.M. Lytvyn, E.P. Markovskiy, V.V. Milenin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 4. — С. 105-114. — Бібліогр.: 29 назв. — англ.
work_keys_str_mv AT arsentyevin newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT bobylav newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT tarasovis newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT shishkovmv newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT boltovetsns newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT ivanovvn newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT kamalovab newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT konakovarv newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT kudrykyaya newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT lytvynos newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT lytvynpm newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT markovskiyep newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
AT mileninvv newtechnologicalpossibilitiestoprepareinpepitaxiallayersaswellasohmicandbarriercontactstothemandthepropertiesofmicrowavediodesmadeontheirbasis
first_indexed 2025-12-07T18:59:37Z
last_indexed 2025-12-07T18:59:37Z
_version_ 1850877125433753600