Indutnyy, I., Lysenko, V., Min'ko, V., Nazarov, A., Tkachenko, A., Shepeliavyi, P., . . . Maidanchuk, I. (2006). Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films. Semiconductor Physics Quantum Electronics & Optoelectronics.
Чикаго стиль цитування (17-те видання)Indutnyy, I.Z, V.S Lysenko, V.I Min'ko, A.N Nazarov, A.S Tkachenko, P.E Shepeliavyi, V.A Dan'ko, та I.Yu Maidanchuk. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics 2006.
Стиль цитування MLA (8-ме видання)Indutnyy, I.Z, et al. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics, 2006.