APA (7th ed.) Citation

Indutnyy, I., Lysenko, V., Min'ko, V., Nazarov, A., Tkachenko, A., Shepeliavyi, P., . . . Maidanchuk, I. (2006). Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films. Semiconductor Physics Quantum Electronics & Optoelectronics.

Chicago Style (17th ed.) Citation

Indutnyy, I.Z, V.S Lysenko, V.I Min'ko, A.N Nazarov, A.S Tkachenko, P.E Shepeliavyi, V.A Dan'ko, and I.Yu Maidanchuk. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics 2006.

MLA (8th ed.) Citation

Indutnyy, I.Z, et al. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics, 2006.

Warning: These citations may not always be 100% accurate.