Indutnyy, I., Lysenko, V., Min'ko, V., Nazarov, A., Tkachenko, A., Shepeliavyi, P., . . . Maidanchuk, I. (2006). Effect of chemical and radiofrequency plasma treatment on photoluminescence of SiOx films. Semiconductor Physics Quantum Electronics & Optoelectronics.
Chicago-Zitierstil (17. Ausg.)Indutnyy, I.Z, V.S Lysenko, V.I Min'ko, A.N Nazarov, A.S Tkachenko, P.E Shepeliavyi, V.A Dan'ko, und I.Yu Maidanchuk. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics 2006.
MLA-Zitierstil (8. Ausg.)Indutnyy, I.Z, et al. "Effect of Chemical and Radiofrequency Plasma Treatment on Photoluminescence of SiOx Films." Semiconductor Physics Quantum Electronics & Optoelectronics, 2006.