Nanocrystalline silicon carbide films for solar cells

Nanocrystalline silicon carbide (nc-SiC) films as protective coating and as solar cell material for a harsh environment, high temperatures, light intensities and radiation, were investigated. p- and n-types 100-mm silicon wafers with (100) orientation were used as substrates for SiC films deposition...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2016
Hauptverfasser: Vlaskina, S.I., Mishinova, V.I., Rodionov, V.E., Svechnikov, G.S.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121599
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Nanocrystalline silicon carbide films for solar cells / S.I. Vlaskina, G.N. Mishinova, V.I. Vlaskin, V.E. Rodionov, G.S. Svechnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 3. — С. 273-278. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-121599
record_format dspace
spelling Vlaskina, S.I.
Mishinova, V.I.
Rodionov, V.E.
Svechnikov, G.S.
2017-06-14T17:38:36Z
2017-06-14T17:38:36Z
2016
Nanocrystalline silicon carbide films for solar cells / S.I. Vlaskina, G.N. Mishinova, V.I. Vlaskin, V.E. Rodionov, G.S. Svechnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 3. — С. 273-278. — Бібліогр.: 6 назв. — англ.
1560-8034
DOI: 10.15407/spqeo19.03.273
PACS 64.70.K-,77.84.Bw, 81.30.-t
https://nasplib.isofts.kiev.ua/handle/123456789/121599
Nanocrystalline silicon carbide (nc-SiC) films as protective coating and as solar cell material for a harsh environment, high temperatures, light intensities and radiation, were investigated. p- and n-types 100-mm silicon wafers with (100) orientation were used as substrates for SiC films deposition. The films were deposited using HighFrequency Plasma Enhanced Chemical Vapor Deposition (HF-PECVD) with CH₃SiCl₃ gas as a silicon and carbon source. Hydrogen supplied CH₃SiCl₃ molecules in the field of HF discharge. Deposition was carried out on a cold substrate. The power density was 12.7 W/cm². Deposition conditions were explored to prepare films with a controlled band gap and a low defect density. Formation of nc-3C-SiC films has been confirmed by the high resolution-transmission electron microscopy analysis, optical band gap values ETauc, conductivity, charge carrier activation energy and Hall measurements. The efficiency of photoconductivity was calculated for evaluating the photoconductivity properties and for the correlations with technology. For p-n junction creation in solar cell fabrication, the ntypes nc-SiC films were doped with Al. Employing Al as a doping material of nc-n-SiC, the open-circuit voltage as high as 1.43 V has been achieved.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Nanocrystalline silicon carbide films for solar cells
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Nanocrystalline silicon carbide films for solar cells
spellingShingle Nanocrystalline silicon carbide films for solar cells
Vlaskina, S.I.
Mishinova, V.I.
Rodionov, V.E.
Svechnikov, G.S.
title_short Nanocrystalline silicon carbide films for solar cells
title_full Nanocrystalline silicon carbide films for solar cells
title_fullStr Nanocrystalline silicon carbide films for solar cells
title_full_unstemmed Nanocrystalline silicon carbide films for solar cells
title_sort nanocrystalline silicon carbide films for solar cells
author Vlaskina, S.I.
Mishinova, V.I.
Rodionov, V.E.
Svechnikov, G.S.
author_facet Vlaskina, S.I.
Mishinova, V.I.
Rodionov, V.E.
Svechnikov, G.S.
publishDate 2016
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Nanocrystalline silicon carbide (nc-SiC) films as protective coating and as solar cell material for a harsh environment, high temperatures, light intensities and radiation, were investigated. p- and n-types 100-mm silicon wafers with (100) orientation were used as substrates for SiC films deposition. The films were deposited using HighFrequency Plasma Enhanced Chemical Vapor Deposition (HF-PECVD) with CH₃SiCl₃ gas as a silicon and carbon source. Hydrogen supplied CH₃SiCl₃ molecules in the field of HF discharge. Deposition was carried out on a cold substrate. The power density was 12.7 W/cm². Deposition conditions were explored to prepare films with a controlled band gap and a low defect density. Formation of nc-3C-SiC films has been confirmed by the high resolution-transmission electron microscopy analysis, optical band gap values ETauc, conductivity, charge carrier activation energy and Hall measurements. The efficiency of photoconductivity was calculated for evaluating the photoconductivity properties and for the correlations with technology. For p-n junction creation in solar cell fabrication, the ntypes nc-SiC films were doped with Al. Employing Al as a doping material of nc-n-SiC, the open-circuit voltage as high as 1.43 V has been achieved.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/121599
citation_txt Nanocrystalline silicon carbide films for solar cells / S.I. Vlaskina, G.N. Mishinova, V.I. Vlaskin, V.E. Rodionov, G.S. Svechnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 3. — С. 273-278. — Бібліогр.: 6 назв. — англ.
work_keys_str_mv AT vlaskinasi nanocrystallinesiliconcarbidefilmsforsolarcells
AT mishinovavi nanocrystallinesiliconcarbidefilmsforsolarcells
AT rodionovve nanocrystallinesiliconcarbidefilmsforsolarcells
AT svechnikovgs nanocrystallinesiliconcarbidefilmsforsolarcells
first_indexed 2025-12-07T16:31:56Z
last_indexed 2025-12-07T16:31:56Z
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