Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication

Electrophysical parameters of Hg₁₋xCdxTe thin films grown by liquid-phase epitaxy and molecular-beam epitaxy were investigated before and after the high-frequency sonication ( fUS = 7.5 MHz, WUS ~ 10⁴ W/m²). It was determined that parameters of MBE-grown Hg₁₋xCdxTe thin films are stable to ultrasoun...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2006
Hauptverfasser: Savkina, R.K., Sizov, F.F., Smirnov, A.B., Tetyorkin, V.V.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2006
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121630
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Zitieren:Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication / R.K. Savkina, F.F. Sizov, A.B. Smirnov, V.V. Tetyorkin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 4. — С. 31-35. — Бібліогр.: 20 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Savkina, R.K.
Sizov, F.F.
Smirnov, A.B.
Tetyorkin, V.V.
author_facet Savkina, R.K.
Sizov, F.F.
Smirnov, A.B.
Tetyorkin, V.V.
citation_txt Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication / R.K. Savkina, F.F. Sizov, A.B. Smirnov, V.V. Tetyorkin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 4. — С. 31-35. — Бібліогр.: 20 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Electrophysical parameters of Hg₁₋xCdxTe thin films grown by liquid-phase epitaxy and molecular-beam epitaxy were investigated before and after the high-frequency sonication ( fUS = 7.5 MHz, WUS ~ 10⁴ W/m²). It was determined that parameters of MBE-grown Hg₁₋xCdxTe thin films are stable to ultrasound effect, while for thin films grown by LPE the sonically stimulated change of the conductivity type was observed. The best agreement between experiment and calculation was obtained in the frame of the assumption about forming of the thin layer with another conductivity type. The possible nature of the observed effect was analyzed.
first_indexed 2025-11-25T21:45:15Z
format Article
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id nasplib_isofts_kiev_ua-123456789-121630
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-25T21:45:15Z
publishDate 2006
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Savkina, R.K.
Sizov, F.F.
Smirnov, A.B.
Tetyorkin, V.V.
2017-06-15T03:27:30Z
2017-06-15T03:27:30Z
2006
Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication / R.K. Savkina, F.F. Sizov, A.B. Smirnov, V.V. Tetyorkin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2006. — Т. 9, № 4. — С. 31-35. — Бібліогр.: 20 назв. — англ.
1560-8034
PACS 43.35.+d, 73.61.Ga, 73.50.Jt
https://nasplib.isofts.kiev.ua/handle/123456789/121630
Electrophysical parameters of Hg₁₋xCdxTe thin films grown by liquid-phase epitaxy and molecular-beam epitaxy were investigated before and after the high-frequency sonication ( fUS = 7.5 MHz, WUS ~ 10⁴ W/m²). It was determined that parameters of MBE-grown Hg₁₋xCdxTe thin films are stable to ultrasound effect, while for thin films grown by LPE the sonically stimulated change of the conductivity type was observed. The best agreement between experiment and calculation was obtained in the frame of the assumption about forming of the thin layer with another conductivity type. The possible nature of the observed effect was analyzed.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
Article
published earlier
spellingShingle Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
Savkina, R.K.
Sizov, F.F.
Smirnov, A.B.
Tetyorkin, V.V.
title Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
title_full Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
title_fullStr Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
title_full_unstemmed Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
title_short Layer structure formation in Hg₁₋xCdxTe films after high-frequency sonication
title_sort layer structure formation in hg₁₋xcdxte films after high-frequency sonication
url https://nasplib.isofts.kiev.ua/handle/123456789/121630
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AT sizovff layerstructureformationinhg1xcdxtefilmsafterhighfrequencysonication
AT smirnovab layerstructureformationinhg1xcdxtefilmsafterhighfrequencysonication
AT tetyorkinvv layerstructureformationinhg1xcdxtefilmsafterhighfrequencysonication