Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties

Exploiting CVD technique for carbon deposition from C₂H₂+H₂+N₂ mixture, a graphene-like film synthesized directly on SiO₂ surface of SiO₂-Si structure was obtained. The graphene-like film was grown under thin Ni layer that is easy exfoliated from graphene-SiO₂-Si structure. Surface of the film was s...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2016
Hauptverfasser: Bortchagovsky, E.G., Vasin, A.V., Lytvyn, P.M., Tiagulskyi, S.I., Slobodian, A.M., Verovsky, I.N., Strelchuk, V.V., Stubrov, Yu., Nazarov, A.N.
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Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/121652
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Zitieren:Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties / E.G. Bortchagovsky, A.V. Vasin, P.M. Lytvyn, S.I. Tiagulskyi, A.M. Slobodian, I.N. Verovsky, V.V. Strelchuk, Yu. Stubrov, A.N. Nazarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 328-333. — Бібліогр.: 19 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Bortchagovsky, E.G.
Vasin, A.V.
Lytvyn, P.M.
Tiagulskyi, S.I.
Slobodian, A.M.
Verovsky, I.N.
Strelchuk, V.V.
Stubrov, Yu.
Nazarov, A.N.
author_facet Bortchagovsky, E.G.
Vasin, A.V.
Lytvyn, P.M.
Tiagulskyi, S.I.
Slobodian, A.M.
Verovsky, I.N.
Strelchuk, V.V.
Stubrov, Yu.
Nazarov, A.N.
citation_txt Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties / E.G. Bortchagovsky, A.V. Vasin, P.M. Lytvyn, S.I. Tiagulskyi, A.M. Slobodian, I.N. Verovsky, V.V. Strelchuk, Yu. Stubrov, A.N. Nazarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 328-333. — Бібліогр.: 19 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Exploiting CVD technique for carbon deposition from C₂H₂+H₂+N₂ mixture, a graphene-like film synthesized directly on SiO₂ surface of SiO₂-Si structure was obtained. The graphene-like film was grown under thin Ni layer that is easy exfoliated from graphene-SiO₂-Si structure. Surface of the film was sufficiently smooth and reveals no winkles and holes; it has a good homogeneity and perfect adhesion to SiO₂ layer. Studying the micro-Raman spectra showed a graphene-like structure of the film; using atomic force microscopic technique, the thickness of film was determined (0.6 nm). Using spectroscopic ellipsometry and simple Cauchy model enabled us to estimate optical parameters of this graphene-like film.
first_indexed 2025-11-24T02:25:30Z
format Article
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
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language English
last_indexed 2025-11-24T02:25:30Z
publishDate 2016
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Bortchagovsky, E.G.
Vasin, A.V.
Lytvyn, P.M.
Tiagulskyi, S.I.
Slobodian, A.M.
Verovsky, I.N.
Strelchuk, V.V.
Stubrov, Yu.
Nazarov, A.N.
2017-06-15T08:11:23Z
2017-06-15T08:11:23Z
2016
Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties / E.G. Bortchagovsky, A.V. Vasin, P.M. Lytvyn, S.I. Tiagulskyi, A.M. Slobodian, I.N. Verovsky, V.V. Strelchuk, Yu. Stubrov, A.N. Nazarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 4. — С. 328-333. — Бібліогр.: 19 назв. — англ.
1560-8034
DOI: 10.15407/spqeo19.04.328
PACS 68.65.Pq, 78.67.Wj
https://nasplib.isofts.kiev.ua/handle/123456789/121652
Exploiting CVD technique for carbon deposition from C₂H₂+H₂+N₂ mixture, a graphene-like film synthesized directly on SiO₂ surface of SiO₂-Si structure was obtained. The graphene-like film was grown under thin Ni layer that is easy exfoliated from graphene-SiO₂-Si structure. Surface of the film was sufficiently smooth and reveals no winkles and holes; it has a good homogeneity and perfect adhesion to SiO₂ layer. Studying the micro-Raman spectra showed a graphene-like structure of the film; using atomic force microscopic technique, the thickness of film was determined (0.6 nm). Using spectroscopic ellipsometry and simple Cauchy model enabled us to estimate optical parameters of this graphene-like film.
This work has been partially supported by Ministry of Education and Science of Ukraine (Project F2904).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
Article
published earlier
spellingShingle Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
Bortchagovsky, E.G.
Vasin, A.V.
Lytvyn, P.M.
Tiagulskyi, S.I.
Slobodian, A.M.
Verovsky, I.N.
Strelchuk, V.V.
Stubrov, Yu.
Nazarov, A.N.
title Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
title_full Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
title_fullStr Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
title_full_unstemmed Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
title_short Direct synthesized graphene-like film on SiO₂: Mechanical and optical properties
title_sort direct synthesized graphene-like film on sio₂: mechanical and optical properties
url https://nasplib.isofts.kiev.ua/handle/123456789/121652
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